2010
DOI: 10.1016/s1005-0302(10)60049-7
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Recent Development of SOFC Metallic Interconnect

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Cited by 324 publications
(138 citation statements)
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“…However, the ASR value for the sample with the porous coating increased at a substantially higher rate during operations, and reached 0.0081 Ohm cm 2 after 500 hours while the ASR value for the sample with the dense coating was 0.0037 Ohm cm 2 after the same duration of time under the same conditions. In general, the metallic SOFC interconnects with the state-of-the-art protective coating show the ASR values of 5∼10 mOhm cm 2 after 500∼1000 hours of operation, 9,18 and the ASR results in Figure 6 indicate that the spinel coating presented in this paper is promising. The spikes of the ASR values, which occurred in the uncoated sample after ∼120 hours of operation, were not observed for both samples up to 500 hours, indicating that the interfaces remained stable and free of structural damage.…”
Section: Resultsmentioning
confidence: 70%
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“…However, the ASR value for the sample with the porous coating increased at a substantially higher rate during operations, and reached 0.0081 Ohm cm 2 after 500 hours while the ASR value for the sample with the dense coating was 0.0037 Ohm cm 2 after the same duration of time under the same conditions. In general, the metallic SOFC interconnects with the state-of-the-art protective coating show the ASR values of 5∼10 mOhm cm 2 after 500∼1000 hours of operation, 9,18 and the ASR results in Figure 6 indicate that the spinel coating presented in this paper is promising. The spikes of the ASR values, which occurred in the uncoated sample after ∼120 hours of operation, were not observed for both samples up to 500 hours, indicating that the interfaces remained stable and free of structural damage.…”
Section: Resultsmentioning
confidence: 70%
“…The ASR value of the uncoated sample was initially 0.0016 Ohm cm 2 and reached 0.017 Ohm cm 2 after 500 hours. During the SOFC operation, growth of the chromia inner scale on Crofer 22 APU, whose thickness could reach several micrometers on the cathode side, is mainly responsible for the increase of ohmic ASR of the stack, 9 and the rapid increase of ASR in the uncoated sample in Figure 6 corresponds to the fast degradation of stack performance. In addition, the formation of interfacial defects, such as voids, cavities and spallation, is also an important factor that influences the stability of the SOFC stacks.…”
Section: Resultsmentioning
confidence: 99%
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