2021
DOI: 10.3329/jsr.v13i1.48992
|View full text |Cite
|
Sign up to set email alerts
|

Recent Development of Trifluoromethyl Reagents: A Review

Abstract: Organic molecules having fluorine atom are very important since it increases the lipophilicity that is essential for drug development and additionally strong carbon-fluorine (C-F) bond makes the material unique, especially for material chemistry. Instead of elemental fluorine, recently trifluoromethylated materials (CF3) have drawn considerable attention in the agrochemical and pharmaceutical industries. In the continuous development of the trifluoromethylated reagents, over the last few decades, some trifluor… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4
1

Citation Types

0
5
0

Year Published

2021
2021
2024
2024

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 10 publications
(5 citation statements)
references
References 91 publications
0
5
0
Order By: Relevance
“…[15][16][17][18] The introduction of a CF 3 group into organic molecules has been quite prominent in the last decade, with some outlining the electronic nature of the recruited reagents, which can be radical, electrophilic or nucleophilic (Scheme 2), while others have focussed on the use of catalysts, the stereoselectivity of reactions, or the type of bonds that are deposited in trifluoromethylation reactions. [19][20][21][22][23][24][25][26][27][28][29][30][31][32] In recent years, numerous reports of trifluoromethylation of hydrocarbons and heteroarenes have appeared using various transition metal complexes. This review aims to paint a comprehensive picture on the various methods involved in transforming metal complexes as catalysts or stoichiometric reagents to selectively functionalize C(sp 3 , sp 2 , and sp)-H/X bonds and also to undergo conventional addition reactions for trifluoromethylations.…”
Section: Introduction To Trifluoromethylationmentioning
confidence: 99%
“…[15][16][17][18] The introduction of a CF 3 group into organic molecules has been quite prominent in the last decade, with some outlining the electronic nature of the recruited reagents, which can be radical, electrophilic or nucleophilic (Scheme 2), while others have focussed on the use of catalysts, the stereoselectivity of reactions, or the type of bonds that are deposited in trifluoromethylation reactions. [19][20][21][22][23][24][25][26][27][28][29][30][31][32] In recent years, numerous reports of trifluoromethylation of hydrocarbons and heteroarenes have appeared using various transition metal complexes. This review aims to paint a comprehensive picture on the various methods involved in transforming metal complexes as catalysts or stoichiometric reagents to selectively functionalize C(sp 3 , sp 2 , and sp)-H/X bonds and also to undergo conventional addition reactions for trifluoromethylations.…”
Section: Introduction To Trifluoromethylationmentioning
confidence: 99%
“…We also report a practical method for the hydrotrifluoromethylation of alkenes that does not rely on the use of gaseous CF 3 I or expensive radical precursors such as Togni or Uemoto reagents. [40] The submitted version of this manuscript has been posted on a preprint server. [41]…”
Section: Introductionmentioning
confidence: 99%
“…Considering the simplicity and efficiency of the method, we envisaged that it could be extended to the hydroperfluoroalkylation of unactivated alkenes (Scheme 1D). We also report a practical method for the hydrotrifluoromethylation of alkenes that does not rely on the use of gaseous CF 3 I or expensive radical precursors such as Togni or Uemoto reagents [40] . The submitted version of this manuscript has been posted on a preprint server [41]…”
Section: Introductionmentioning
confidence: 99%
“…We also report a practical method for the hydrotrifluoromethylation of alkenes that does not rely on the use of gaseous CF3I or expensive radical precursors such as Togni or Uemoto reagents. [39]…”
Section: Introductionmentioning
confidence: 99%