Recent developments in magnetron-sputtered silicon nitride coatings of improved mechanical and tribological properties for extreme situations

Rao, Akula Umamaheswara; Tiwari, Sunil Kumar; Goyat, M.S.; Chawla, Amit Kumar

doi:10.1007/s10853-023-08575-4

Cited by 11 publications

(3 citation statements)

References 210 publications

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“…The results show that the hardness (H) and elastic modulus (E) of the coatings deposited at different flow ratios ranged from 22 to 27 GPa and from 250 to 300 GPa, respectively (figure 5(a)). These values were higher than those of silicon nitride deposited using other techniques such as PECVD (with a hardness of 11-22 GPa and elastic modulus of 100-200 GPa) [34,35], PVD (with a hardness of 9-19 GPa and elastic modulus of 118-200 GPa) [36] and rHiPIMS (with a hardness of 13-25 GPa and elastic modulus of 150-300 GPa) [23], which is most likely due to the higher density of the silicon nitride coatings deposited by the LPCVD technique [16]. Furthermore, it was observed that the hardness of the coatings increased significantly with an increasing flow ratio until it reached a maximum at a flow ratio of 4.…”

Section: Mechanical Properties Of the Coatingsmentioning

confidence: 65%

Effects of N/Si ratio on mechanical properties of amorphous silicon nitride coating

Zhou,

Persson,

Xia

et al. 2023

Mater. Res. Express

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The utilization of silicon nitride coatings has been proposed as an effective method to enhance wear resistance and mitigate the release of metallic ions from biomedical implants. However, the relatively high dissolution rate of low-density coatings remains an obstacle to their implementation. Here, chemical vapour deposition techniques may have advantages over the typically used physical vapour deposition (PVD) methods. Therefore, in this study, silicon nitride coatings were obtained by low-pressure chemical vapor deposition (LPCVD). Since the nitrogen-to-silicon (N/Si) ratio and deposition temperature have been reported as major factors affecting the performance of the coatings, the effects of ammonia (NH3) to dichlorosilane (SiH2Cl2) flow ratio and deposition temperature were systemically investigated in the form of microstructure, mechanical and tribological properties of the coatings. The results revealed that the coatings exhibited a dense structure. As the ammonia flow ratio increased, the surface became smoother, and the hardness and elastic modulus increased and reached the maximum at a flow ratio of 4, giving a hardness of around 27 GPa and an elastic modulus of 290 GPa, respectively. The higher mechanical properties of the coatings deposited at a flow ratio of 4 are attributed to the stronger covalent Si-N bonding, as confirmed by XPS results. However, the coatings deposited at a flow ratio of 2 exhibited the lowest wear rate, at 9.5 × 10−7 mm3 Nm−1, around one-third of the value of the coatings deposited at a flow ratio of 6, likely due to the high silicon content of these coatings. Increasing the temperature resulted in an increased deposition rate, higher hardness and elastic modulus as well as a lower wear rate, likely due to incomplete reactions at lower temperatures. The generally high hardness and low wear rate indicate that the coatings deposited by LPCVD are promising for application in spinal implants.

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Section: Mechanical Properties Of the Coatingsmentioning

confidence: 65%

Effects of N/Si ratio on mechanical properties of amorphous silicon nitride coating

Zhou,

Persson,

Xia

et al. 2023

Mater. Res. Express

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“…Titanium nitride (TiN) was introduced to the global market in the 1970s as a super-hard material (2000 kg/mm 2 ) for protective coatings [1][2][3][4][5]. Furthermore, TiN has a high melting temperature (3000 • C), corrosion resistance, exceptional mechanical strength, and durability, as well as biological compatibility.…”

Section: Introductionmentioning

confidence: 99%

Deposition of Polymers on Titanium Nitride Electrodes

Efremenko,

Laroussi,

Sengül

et al. 2024

Coatings

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The application of titanium nitride (TiN) as an electrode for electrochemical deposition or characterization requires the removal of an insulating layer from its surface. This process was studied and optimized, and the conditions for the complete removal of this layer through treatment with oxalic acid were formulated. The obtained TiN surfaces were used for the deposition of various conducting and non-conducting polymers. Two different approaches were applied: (i) in situ electrochemical synthesis of the main classes of conducting polymers, including polyaniline, polypyrrole, polythiophene, and selected derivatives thereof, and (ii) electrostatically driven layer-by-layer (LbL) deposition of multilayers of oppositely charged polyelectrolytes. The deposited polymers were characterized by electrochemical methods. The electrochemical properties of the deposited conducting polymers and their deposition on the TiN surface were comparable to those of the metallic electrodes. The films produced via LbL deposition exhibited a pronounced influence of the charge of the last deposited polymer on the redox reaction of ferri/ferrocyanide, validating the charge alteration with each successive polymer layer deposition. The studied deposition technologies can be used for the modification of TiN surfaces required in applications of this material in chemical sensors and other devices.

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“…The deposition of nitride coatings is commonly performed using the reactive magnetron sputtering technique. This method has been widely espoused in scientific research and industrial applications due to its various advantages over the other techniques [13]. The deposition parameters have a significant impact on the characteristics of magnetron sputtered VN coatings.…”

Section: Introductionmentioning

confidence: 99%

Impact of sputtering gas on the microstructural, mechanical and wetting properties of vanadium nitride coatings

Rao,

Tiwari,

Kharb

et al. 2023

Phys. Scr.

Self Cite

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Vanadium nitride (VN) coatings were deposited via reactive DC magnetron sputtering technique on a hot substrate (400 °C) with varying partial pressure of N2. The impact of nitrogen partial pressure on the crystal structure, microstructure, elemental composition, surface topography, mechanical and wetting properties of VN coatings was investigated using grazing incidence X-ray diffraction (GIXRD), Raman spectroscopy, field emission scanning electron microscope (FESEM), energy dispersive spectroscopy (EDS), atomic force microscope (AFM), nano-indentation, and drop shape analyzer (DSA). The variation in the N2 partial pressure leads the significant changes in the microstructure, mechanical and wetting properties of the coatings. The GIXRD spectra reveals the formation of crystalline FCC phase in the deposited VN coatings. However, at 100% N2 partial pressure, the preferred orientation of crystal planes changes from (200) to (220). The FESEM image reveals that at low N2 partial pressure, the coating exhibits well-separated grains with clearly visible grain boundaries. As the N2 partial pressure increases, the agglomeration of grains becomes more pronounced, and the grain boundaries become less discernible. However, at 100% N2 partial pressure, the structure transforms into triangular nanoflake-like prismatic structures with voids. The VN coatings with 60% N2 partial pressure exhibits the highest mechanical properties whereas at 100% N2 partial pressure, the VN coatings reveal super-hydrophilic character.

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Recent developments in magnetron-sputtered silicon nitride coatings of improved mechanical and tribological properties for extreme situations

Cited by 11 publications

References 210 publications

Effects of N/Si ratio on mechanical properties of amorphous silicon nitride coating

Effects of N/Si ratio on mechanical properties of amorphous silicon nitride coating

Deposition of Polymers on Titanium Nitride Electrodes

Impact of sputtering gas on the microstructural, mechanical and wetting properties of vanadium nitride coatings

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