Recent progress in atomic layer deposition of molybdenum disulfide: a mini review

Huang, Yazhou; Liu, Lei

doi:10.1007/s40843-018-9403-8

Cited by 24 publications

(27 citation statements)

References 68 publications

(134 reference statements)

Supporting

Mentioning

Contrasting

Unclassified

Order By: Relevance

“…For more details on deposition chemistry and processes, the reader is referred to earlier reviews. [47][48][49][50] In Table 2, we provide a list of ALD TMDC papers until the end of August 2020 including the precursors, deposition, and post-treatment temperatures, examined film thicknesses, crystallinity and grain size, and applications. In Table 3, analogous information is provided for TMDC films produced by conversion (chalcogenization) of ALD grown films.…”

Section: Atomic Layer Deposition Processes For 2d Metal Dichalcogenidesmentioning

confidence: 99%

“…Deposition of TMDCs by ALD and their optoelectronic applications reported up to November 2018 have been reviewed by the authors. [47] Furthermore, Hao et al [48] have provided an extensive review on ALD of 2D materials up to early 2018, whereas Huang and Liu [49] have reviewed deposition of MoS 2 by ALD. In early 2020, Cai et al [50] published another broad review concerning deposition of 2D materials by ALD.…”

Section: Introductionmentioning

confidence: 99%

“…[ 47 ] Furthermore, Hao et al. [ 48 ] have provided an extensive review on ALD of 2D materials up to early 2018, whereas Huang and Liu [ 49 ] have reviewed deposition of MoS 2 by ALD. In early 2020, Cai et al.…”

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond

Mattinen

Leskelä

Ritala

2021

Adv Materials Inter

View full text Add to dashboard Cite

it was soon replaced by other materials. Research on the fundamental properties and preparation of TMDC monolayers in solution (1986), [8] on single-crystal substrates in ultrahigh vacuum (2001), [9] and in an accessible way using mechanical exfoliation [10] (2005) followed. It was the discovery of graphene in 2004 [11] with its ever expanding list of unique and exciting properties, phenomena, and potential applications [12] that amassed broad attention to 2D materials and resulted in the 2010 Nobel Prize in Physics awarded to Andre Geim and Konstantin Novoselov. Tremendous efforts have been put toward synthesis and applications of graphene, including the billion euro Graphene Flagship project funded by the European Union. [13,14] Graphene is a semimetal, however, and the need to have semiconducting materials for many crucial applications, in particular in electronics, has led researchers to search for other 2D materials. The scientific community turned to TMDCs following breakthroughs in observation of unique thickness-dependent properties, [15,16] monolayer synthesis using chemical vapor deposition (CVD), [17,18] and demonstration of high-performance semiconductor devices [19-21] in 2010-2013 (Figure 1). Indeed, in 2013 the number of scientific publications on TMDCs, in particular MoS 2 , nearly tripled over 2012, and the strong growth has continued to date, fueled by advances in synthesis, new devices, and exciting physical phenomena. The explosive growth in MoS 2 research has also expanded to other TMDCs, [22] resulting in yet new phenomena and potential applications being found. [23-26] It is now clear that TMDCs are remarkable in many ways. Their layered crystal structure gives rise to fundamental physics not seen in 3D materials, which enables novel devices and applications. [25,26,32,34-36] The layered structure also gives TMDCs their highly anisotropic properties, extremely high specific surface areas, possibility to intercalate different species between the layers, and stability as ultrathin sheets down to three atomic layers thick. The TMDC family contains dozens of different materials from semiconductors to semimetals, metals, and even superconductors. [5,22,25,34] However, TMDC research is still mostly in the early discovery stages and the investigations of TMDCs largely continue using flakes produced by mechanical exfoliation of bulk crystals. [10,26] Unfortunately, this method cannot be scaled up for practical 2D transition metal dichalcogenides (TMDCs) are among the most exciting materials of today. Their layered crystal structures result in unique and useful electronic, optical, catalytic, and quantum properties. To realize the technological potential of TMDCs, methods depositing uniform films of controlled thickness at low temperatures in a highly controllable, scalable, and repeatable manner are needed. Atomic layer deposition (ALD) is a chemical gas-phase thin film deposition method capable of meeting these challenges. In this review, the applications evaluated for ALD TMDCs are systematically...

show abstract

Section: Atomic Layer Deposition Processes For 2d Metal Dichalcogenidesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond

Mattinen

Leskelä

Ritala

2021

Adv Materials Inter

View full text Add to dashboard Cite

show abstract

“…Compared with CVD setups, AFD devices are more 'intelligent' and can control the atomic structure, size, pressure and other aspects [125]. The high uniformity and controllable size of the films prepared using AFD has led to great achievements in the field of film manufacturing [126][127][128]. Layered MoS2 was successfully synthesized by atomic layer deposition [129].…”

Section: Chemical Vapor Depositionmentioning

confidence: 99%

Strategies to improve electrocatalytic and photocatalytic performance of two-dimensional materials for hydrogen evolution reaction

Sun

Guan

2021

Chinese Journal of Catalysis

162

View full text Add to dashboard Cite

“…[ 158–160 ] ALD is a promising method to reduce the usage of precious metals, as already one ALD cycle is enough to activate the photocathode, and three cycles were found to uniformly cover the surface with Pt nanoparticles from 0.5 to 3 nm. [ 159 ] Another promising HER catalyst, molybdenum disulfide (MoS 2 ) has only recently become available for ALD deposition, [ 161 ] due to lack of suitable precursors. It has been prepared directly by ALD in H 2 S plasma [ 162 ] or by the sulphurization of ALD‐deposited MoO x .…”

Section: Catalystmentioning

confidence: 99%

Atomic Layer Deposition for the Photoelectrochemical Applications

Pastukhova

Mavrič

2021

Adv Materials Inter

View full text Add to dashboard Cite

Substantial progress has been made in the photoelectrochemical (PEC) field to understand the photoelectrode behavior, semiconductor‐electrolyte interface, and photocorrosion, enabling new photoelectrode architectures with higher photocurrent, reduced photovoltage losses, and longer lifetime. Nevertheless, for practical PEC applications additional efforts are still needed to optimize all components of the photoelectrodes, including the light absorbing semiconductors, the layers for charge extraction, charge transfer, corrosion protection, and catalysis. In this regard, atomic layer deposition (ALD) offers new opportunities due to the monolayer‐by‐monolayer deposition approach, allowing preparation of conformal films with precisely controlled thickness and composition. As the ALD instruments are becoming widely accessible, this review aims to make an overview of the applications for photoelectrodes fabrication. The deposition of semiconductors onto flat and nano‐textured substrates, the deposition of ultrathin interlayers to ease charge transport by energy band alignment and surface states passivation, the deposition of corrosion protection layers, and finally, the possibilities for high catalyst dispersion is presented.

show abstract

Recent progress in atomic layer deposition of molybdenum disulfide: a mini review

Cited by 24 publications

References 68 publications

Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond

Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond

Strategies to improve electrocatalytic and photocatalytic performance of two-dimensional materials for hydrogen evolution reaction

Atomic Layer Deposition for the Photoelectrochemical Applications

Contact Info

Product

Resources

About