Cleo: 2013 2013
DOI: 10.1364/cleo_at.2013.jm4k.5
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Recent Progress in Development Orientation-Patterned GaP for Next-Generation Frequency Conversion Devices

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Cited by 5 publications
(5 citation statements)
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“…Obviously, at certain conditions the HVPE growth is more favorable to one of the domain orientations—the one in which domains propagate along [01ī] direction and are associated with the growth on the substrate surface, than the one in which domains propagate along the opposite [011] direction and are associated with the growth on the inverted layer. This is in a good agreement with our previous studies [ 20,33,34 ] as well with some others. [ 26 ]…”
Section: Resultssupporting
confidence: 94%
See 1 more Smart Citation
“…Obviously, at certain conditions the HVPE growth is more favorable to one of the domain orientations—the one in which domains propagate along [01ī] direction and are associated with the growth on the substrate surface, than the one in which domains propagate along the opposite [011] direction and are associated with the growth on the inverted layer. This is in a good agreement with our previous studies [ 20,33,34 ] as well with some others. [ 26 ]…”
Section: Resultssupporting
confidence: 94%
“…Optimization of the reactor configuration and process parameters resulted in a significant increase of the growth rate [ 22–24 ] and improvement of the surface morphology and crystalline layer quality compared to our previously reported efforts. [ 20,33,34 ] Faster growth rates of up to 210 μm h −1 for growths with 1 h duration (Table 2: run 1), smoother surface morphology (RMS = 1–2 nm), and crystalline quality similar to the commercial substrate quality were achieved with GaP/GaAs, GaAs/GaP, GaAs x P 1‐ x /GaAs, and GaAs x P 1‐ x /GaP heteroepitaxy. Although the growth of GaAs/GaP (Table 2: run 5 and Figure a) can be considered less favorable due to the positive lattice mismatch, [ 35,36 ] even this heteroepitaxial case resulted in a faster growth rate (170 μm h −1 ) than the growth rate of 150 μm/h for GaAs/GaAs homoepitaxy (Table 2: run 2 and Figure 1b), which was performed at the same growth conditions.…”
Section: Resultsmentioning
confidence: 99%
“…The two-photon absorption edge is shifted to 1 µm and the crystals are transparent to 12.5 µm, with d 36 = 75 pmV −1 [67]. The patterning process is similar to that of OP-GaAs, with >1 mm layer thicknesses achieved repeatably [68]. Parametric downconversion has been demonstrated using a variety of pump lasers, including Yb:fiber [69][70][71], Er:fiber [72], Q-switched Nd:YVO 4 [73] and Nd:YAG lasers [74], and through difference frequency generation [75,76].…”
Section: Quasi-phase-matched Semiconductorsmentioning
confidence: 80%
“…[21], and details on the reactor used by Tassev et al can be found in ref. [22]. The growth parameters of GaP SAG conducted in [110] and [1false¯10]‐oriented openings were optimized to achieve high vertical growth rate and equal lateral growth rate in the two kinds of openings that are desired by OP‐GaP growth.…”
Section: Methodsmentioning
confidence: 99%