“…Overall, E-TOFMS is a versatile tool for the analysis of complex plasma processes involving multiple energetic and chemical species, therefore in particular suitable for supporting development in thin film technology, where the IEDF for multiple ions is of interest. Examples of such areas include the development of high entropy alloy or compound films, where the energy of the impinging species influences the structure and microstructure of the grown film, ,,, or optimisation of thin film systems and interfaces in electronics, photovoltaics, and energy storage. The presented applications focus on PVD, specifically magnetron sputtering, however, it is likely that it will prove to be useful in the context of plasma enhanced chemical vapor deposition and atomic layer deposition (PE-CVD, PE-ALD) in general, where information on the IEDF and the nature of the ionic species involved in film growth are important for understanding the growth mechanism.…”