Recent progress of EUV wavefront metrology in EUVA

Hasegawa, Masanobu; Ouchi, Chidane; Hasegawa, Takayuki; Kato, S.; Ohkubo, Akinori; Suzuki, Atsushi; Sugisaki, Katsumi; Okada, Masashi; Murakami, Katsuhiko; Saito, Jun; Niibe, Masahito; Takeda, Mitsuo

doi:10.1117/12.562431

Cited by 18 publications

(4 citation statements)

References 5 publications

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“…High fringe contrast and sensitivity can also be achieved using a single-grating when the grating-to-detector distance is set to a multiple (or a fraction) of the Talbot distance. [7][8][9] This distance is determined by the wavelength, the grating pitch, and the incident beam's wavefront curvature.…”

Section: Current Wavefront-sensing Modesmentioning

confidence: 99%

X-ray wavefront sensor development at the Advanced Light Source

Goldberg,

Wojdyla,

Bryant

et al. 2023

Advances in Metrology for X-Ray and EUV Optics X

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At Lawrence Berkeley National Laboratory’s Advanced Light Source, we are developing x-ray wavefront sensors to support the creation and operation of beamlines with diffraction-limited quality. Our new approach to rapid, intermittent wavefront sensing operates in reflection at glancing incidence angles and is compatible with the high-power densities of modern beamlines. For soft x-ray applications especially, the wavefront sensor can operate upstream of the exit slit in a vertically dispersed beam. This single-shot technique supports lateral shearing interferometry and Hartmann wavefront sensing; it can be adapted to speckle-based techniques as well. The reflected beam is directed to an off-axis YAG crystal that produces scintillated visible light. A small mirror reflects the light to a microscope and camera, and the measured wavefront shape information can be used as feedback to adaptive x-ray mirror elements. A compact array of gratings enables measurement across a broad range of photon energies or wavefront curvatures. We describe recent demonstrations at soft x-ray and hard x-ray wavelengths measuring an adaptive x-ray mirror, and a toroidal focusing mirror.

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Section: Current Wavefront-sensing Modesmentioning

confidence: 99%

X-ray wavefront sensor development at the Advanced Light Source

Goldberg,

Wojdyla,

Bryant

et al. 2023

Advances in Metrology for X-Ray and EUV Optics X

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“…The EEI works well and the seven types of the interferograms were successfully obtained. [3][4][5][6] In this paper, we report on comparisons among seven metrological methods. The comparisons are performed from the viewpoints of accuracy, precision and practicality.…”

Section: Introductionmentioning

confidence: 99%

Comparisons between EUV at-wavelength metrological methods

Sugisaki

Okada

Zhu

et al. 2005

Advances in Metrology for X-Ray and EUV Optics

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“…The measurement of system wavefront aberration for the projection lens is one of the core technologies for the development of lithography [1][2][3][4]. There are several methods to measure system wavefront aberration, such as grating lateral shearing interferometry [5][6][7][8] and point diffraction interferometry [9][10][11][12]. Compared with the point diffraction interferometry, it is easy to realize the ultra-high precision measurement of high numerical aperture (NA) projection lens with grating lateral shearing interferometry.…”

Section: Introductionmentioning

confidence: 99%

Calibration Method to Eliminate Zeroth Order Effect in Lateral Shearing Interferometry

Fang

Xiang

et al. 2018

Photonic Sens

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In this paper, a calibration method is proposed which eliminates the zeroth order effect in lateral shearing interferometry. An analytical expression of the calibration error function is deduced, and the relationship between the phase-restoration error and calibration error is established. The analytical results show that the phase-restoration error introduced by the calibration error is proportional to the phase shifting error and zeroth order effect. The calibration method is verified using simulations and experiments. The simulation results show that the phase-restoration error is approximately proportional to the phase shift error and zeroth order effect, when the phase shifting error is less than 2° and the zeroth order effect is less than 0.2. The experimental result shows that compared with the conventional method with 9-frame interferograms, the calibration method with 5-frame interferograms achieves nearly the same restoration accuracy.

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Recent progress of EUV wavefront metrology in EUVA

Cited by 18 publications

References 5 publications

X-ray wavefront sensor development at the Advanced Light Source

X-ray wavefront sensor development at the Advanced Light Source

Comparisons between EUV at-wavelength metrological methods

Calibration Method to Eliminate Zeroth Order Effect in Lateral Shearing Interferometry

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