2014
DOI: 10.1364/oe.22.024678
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Reconstruction of sub-wavelength features and nano-positioning of gratings using coherent Fourier scatterometry

Abstract: Abstract:Optical scatterometry is the state of art optical inspection technique for quality control in lithographic process. As such, any boost in its performance carries very relevant potential in semiconductor industry. Recently we have shown that coherent Fourier scatterometry (CFS) can lead to a notably improved sensitivity in the reconstruction of the geometry of printed gratings. In this work, we report on implementation of a CFS instrument, which confirms the predicted performances. The system, although… Show more

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Cited by 53 publications
(46 citation statements)
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“…It is the same as for coherent Fourier scatterometry experiments [4,7,12]. The light is focused by an MO to the sample.…”
Section: Principle Of Detectionmentioning
confidence: 99%
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“…It is the same as for coherent Fourier scatterometry experiments [4,7,12]. The light is focused by an MO to the sample.…”
Section: Principle Of Detectionmentioning
confidence: 99%
“…In case of scanning spot Fourier scatterometry [4,6,7,12,13] and interferometric Fourier scatterometry [8,14] the phase is measured between the reflected orders and with regard to a reference beam, respectively, whereas ellipsometric Fourier scatterometry measures the phase between the reflections of perpendicular polarizations. Figure 2 shows the absolute values (left graph) and phases (right graph) of the complex reflection coefficient ratios for TE and TM polarizations (equivalent with tan(Ψ) and ∆ in Eq.…”
Section: Principle Of Detectionmentioning
confidence: 99%
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