1976
DOI: 10.1007/bf00704130
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Recrystallization of tungsten alloys

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Cited by 8 publications
(2 citation statements)
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“…The PnSC device in this study was designed for hightemperature measurements. Specifically, the heating element was fabricated from a 100 nm thick W−Ti alloy film with a high recrystallization temperature, 33 extending the operating temperature to 1400 K. The membrane was fabricated from Si 3 N 4 with a total thickness of approximately 300 nm. Figure S1 in the Supporting Information provides more detailed information on the microfabrication processes used to make the device.…”
Section: ■ Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…The PnSC device in this study was designed for hightemperature measurements. Specifically, the heating element was fabricated from a 100 nm thick W−Ti alloy film with a high recrystallization temperature, 33 extending the operating temperature to 1400 K. The membrane was fabricated from Si 3 N 4 with a total thickness of approximately 300 nm. Figure S1 in the Supporting Information provides more detailed information on the microfabrication processes used to make the device.…”
Section: ■ Introductionmentioning
confidence: 99%
“…Specifically, the heating element was fabricated from a 100 nm thick W-Ti alloy film with a high recrystallization temperature 33 , extending the operating temperature to 1,400 K.…”
Section: Nano-calorimetry Sensorsmentioning
confidence: 99%