2020
DOI: 10.1007/s00339-020-03705-0
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Reduced doping efficiency of aluminium in Al-doped ZnO film: role of excess aluminium and deposition rate

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“…By extrinsic doping with Al, introduced interstitially or substitutionally for Zn, the space around the defect is changed, and the layers of Al-doped ZnO (AZO) are characterized by a good transparency and electrical conductivity [22][23][24]. Different methods have been tested for the deposition of ZnO doped with Al (or In), such as sol-gel [25,26] and co-sputtering of ceramic targets [27], emphasizing the effect of dopant chemical state [25] and dopant excess [27] on the doping efficiency. Other deposition methods include pulsed laser deposition [28], spin coating [29], reactive pulsed laser deposition [30], the effect of deposition conditions on the morphological, structural, optical, and electrical properties of the film being investigated.…”
Section: Introductionmentioning
confidence: 99%
“…By extrinsic doping with Al, introduced interstitially or substitutionally for Zn, the space around the defect is changed, and the layers of Al-doped ZnO (AZO) are characterized by a good transparency and electrical conductivity [22][23][24]. Different methods have been tested for the deposition of ZnO doped with Al (or In), such as sol-gel [25,26] and co-sputtering of ceramic targets [27], emphasizing the effect of dopant chemical state [25] and dopant excess [27] on the doping efficiency. Other deposition methods include pulsed laser deposition [28], spin coating [29], reactive pulsed laser deposition [30], the effect of deposition conditions on the morphological, structural, optical, and electrical properties of the film being investigated.…”
Section: Introductionmentioning
confidence: 99%