2013 American Control Conference 2013
DOI: 10.1109/acc.2013.6580705
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Reduced-order modeling of thermally induced deformations on reticles for extreme ultraviolet lithography

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Cited by 3 publications
(15 citation statements)
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“…The equations for the thermal state and deformation of the short stroke chuck have already been obtained in [6] by using the FEM. In a slightly modified form, this derivation is put in the Appendix for completeness, with the only notable change being that the coefficients of the reticle's CTE curve are now explicit in the notation due to their potential role as parameters to be estimated.…”
Section: B Description Of the Large-scale Thermo-mechanical Modelmentioning
confidence: 99%
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“…The equations for the thermal state and deformation of the short stroke chuck have already been obtained in [6] by using the FEM. In a slightly modified form, this derivation is put in the Appendix for completeness, with the only notable change being that the coefficients of the reticle's CTE curve are now explicit in the notation due to their potential role as parameters to be estimated.…”
Section: B Description Of the Large-scale Thermo-mechanical Modelmentioning
confidence: 99%
“…To surmount this obstacle, model reduction techniques were developed in [6] for the specific case of x 0 = 0, which corresponds to the situation where the whole system is in cold state, at the temperature T ref . However, in a steadily running EUV machine, the initial condition is not necessarily zero at every location in the system as many reticle exchanges occur without waiting for all the adjacent components like the burl layer, clamp, and chuck to cool down.…”
Section: Approximation Of the Large-scale Modelmentioning
confidence: 99%
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