Reduced photoresist scumming tendencies through the optimization of photoresist formulation parameters

Bell, K L; Dixit, Sunit S.; Kautz, Rylan; Koes, T.; Lazarus, Richard M.; Talor, George

doi:10.1016/0167-9317(93)90073-e

Microelectronic Engineering

1993

DOI: 10.1016/0167-9317(93)90073-e

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Reduced photoresist scumming tendencies through the optimization of photoresist formulation parameters

K L Bell¹,

Sunit S. Dixit²,

Rylan Kautz³

et al.

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Reduced photoresist scumming tendencies through the optimization of photoresist formulation parameters

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