Reducing the resistivity of electron and ion beam assisted deposited Pt

Langford, R. M.; Wang, T. X.; Özkaya, Doğan

doi:10.1016/j.mee.2007.01.055

Cited by 113 publications

(90 citation statements)

References 18 publications

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“…At the frequency corresponding to the maximum CD value (700 nm), 1/k r can be estimated 31,32 to be B470 nm for pure platinum nanowires. Even considering a Pt/C mixture with 40% Pt and 60% C for the helical nanowires (which is the expected average Pt content of the investigated FIBID structures in agreement with the reported value for the FIBID technique in literature 33 ) this penetration length scales down to B150 nm, that is, larger than the mutual interwire distance. In fact, because of the close-proximity arrangement of the helices, the air gap between the respective nanowires is only 100 nm.…”

Section: Resultssupporting

confidence: 90%

Triple-helical nanowires by tomographic rotatory growth for chiral photonics

et al. 2015

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Three dimensional helical chiral metamaterials resulted in effective manipulation of circularly polarized light in the visible infrared for advanced nanophotonics. Their potentialities are severely limited by the lack of full rotational symmetry preventing broadband operation, high signal-to-noise ratio and inducing high optical activity sensitivity to structure orientation. Complex intertwined three dimensional structures such as multiple-helical nanowires could overcome these limitations, allowing the achievement of several chiro-optical effects combining chirality and isotropy. Here we report three dimensional triple-helical nanowires, engineered by the innovative tomographic rotatory growth, on the basis of focused ion beam-induced deposition. These three dimensional nanostructures show up to 37% of circular dichroism in a broad range (500-1,000 nm), with a high signal-to-noise ratio (up to 24 dB). Optical activity of up to 8°only due to the circular birefringence is also shown, tracing the way towards chiral photonic devices that can be integrated in optical nanocircuits to modulate the visible light polarization.

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Section: Resultssupporting

confidence: 90%

Triple-helical nanowires by tomographic rotatory growth for chiral photonics

et al. 2015

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“…These results are consistent with previous experimental 15,16 and theoretical 17 works on sputtering, deposition, 18,19 and secondary electron emission. [20][21][22] Moreover, the energy spectrum of the secondary electrons shifts slightly to higher energies with increasing ion energy, consistent with related studies.…”

Section: Discussionsupporting

confidence: 93%

Roles of secondary electrons and sputtered atoms in ion-beam-induced deposition

Chen¹,

Salemink²,

Alkemade³

2009

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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The authors report the results of investigating two models for ion-beam-induced deposition ͑IBID͒. These models describe IBID in terms of the impact of secondary electrons and of sputtered atoms, respectively. The yields of deposition, sputtering, and secondary electron emission, as well as the energy spectra of the secondary electrons were measured in situ during IBID using ͑CH 3 ͒ 3 Pt͑C P CH 3 ͒ as functions of Ga + ion incident angle ͑0°-45°͒ and energy ͑5-30 keV͒. The deposition yield and the secondary electron yield have the same angular dependences but very different energy dependences. It was also found that the deposition yield per secondary electron is very high ͑ӷ10͒. However, within the investigated angle and energy ranges, the deposition yield is linearly related to the sputtering yield, the offset of which might be due to the contribution of primary ions. They conclude that the sputtered atom model describes IBID better than the secondary electron model.

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“…This results in deposits with high organic content ͑mostly carbon͒ and correspondingly poor metallic character. 31 Strategies to increase the purity of metal-containing nanostructures were recently the topic of a review by Botman et al, 32 discussing the use of variable electron beam parameters as well as in situ and ex situ annealing and reactive gas treatments. For example, it has been observed that increasing the power density of the incident electron beam and/or decreasing the steady-state concentration of the precursor during deposition results in an increase in deposited metal content although no study to date has produced 100% metallic purity using such a strategy.…”

Section: A͒mentioning

confidence: 99%

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

Wnuk

Gorham

Rosenberg

et al. 2010

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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Focused electron beam induced processing ͑FEBIP͒ of volatile organometallic precursors has become an effective and versatile method of fabricating metal-containing nanostructures. However, the electron stimulated decomposition process responsible for the growth of these nanostructures traps much of the organic content from the precursor's ligand architecture, resulting in deposits composed of metal atoms embedded in an organic matrix. To improve the metallic properties of FEBIP structures, the metal content must be improved. Toward this goal, the authors have studied the effect of atomic hydrogen ͑AH͒ and atomic oxygen ͑AO͒ on gold-containing deposits formed from the electron stimulated decomposition of the FEBIP precursor, dimethyl-͑acetylacetonate͒ gold͑III͒, Au III ͑acac͒Me 2 . The effect of AH and AO on nanometer thick gold-containing deposits was probed at room temperature using a combination of x-ray photoelectron spectroscopy ͑XPS͒, scanning Auger electron spectroscopy, and atomic force microscopy ͑AFM͒. XPS revealed that deposits formed by electron irradiation of Au III ͑acac͒Me 2 are only Ϸ10% gold, with Ϸ80% carbon and Ϸ10% oxygen. By exposing deposits to AH, all of the oxygen atoms and the majority of the carbon atoms were removed, ultimately producing a deposit composed of Ϸ75% gold and Ϸ25% carbon. In contrast, all of the carbon could be etched by exposing deposits to AO, although some gold atoms were also oxidized. However, oxygen was rapidly removed from these gold oxide species by subsequent exposure to AH, leaving behind purely metallic gold. AFM analysis revealed that during purification, removal of the organic contaminants was accompanied by a decrease in particle size, consistent with the idea that the radical treatment of the electron beam deposits produced close packed, gold particles. The results suggest that pure metallic structures can be formed by exposing metal-containing FEBIP deposits to a sequence of AO followed by AH.

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Reducing the resistivity of electron and ion beam assisted deposited Pt

Cited by 113 publications

References 18 publications

Triple-helical nanowires by tomographic rotatory growth for chiral photonics

Triple-helical nanowires by tomographic rotatory growth for chiral photonics

Roles of secondary electrons and sputtered atoms in ion-beam-induced deposition

Atomic radical abatement of organic impurities from electron beam deposited metallic structures

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