Hydroxyl (-OH) is one of the main impurities in silica glass which has strong optical absorption near the infrared spectral region and greatly weakens the glass's optical performance. 1 To eliminate the hydroxyl impurities in silica glass, a two-step chemical vapor deposition (CVD) method is developed for fabricating silica glass ingot with low or controllable hydroxyl concentrations, which has drawn wide attentions in recent years. 2,3,4 The CVD synthesis of silica glass is mainly based on flame hydrolysis reaction, in which silicon-containing compounds (e.g., SiCl 4 , organosilicone, etc.) react in an oxygen-hydrogen flame to form SiO 2 particles. 5 In direct CVD method, the flame hydrolysis reaction works at high temperatures, and the melted SiO 2 particles deposit on the substrate to form silica glass directly after cooling. 6 By contrast, in two-step CVD method the flame hydrolysis reaction works at lower