Reduction of anatase TiO[sub 2] on Si(111) by ion beam sputtering

Abstract

Roles of secondary electrons and sputtered atoms in ion-beam-induced depositionSecond order nonlinear optical properties of zinc oxide films deposited by low temperature dual ion beam sputtering Abstract. Titanium dioxide (TiO 2 ) is deposited on Si(111) substrate by Pulsed Laser Deposition (PLD) technique and is investigated using Raman Spectroscopy and X-ray Photoelectron Spectroscopy (XPS) techniques. Raman Spectroscopy indicates that the as-deposited TiO 2 film is in anatase phase. After sputtering in-situ in the XPS preparation chamber, TiO 2 is reduced to TiO and Ti metal, and the reduction is more prominent in the top layers of the film.