2001
DOI: 10.1007/s11664-001-0055-6
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Reduction of photoresist usage during spin coating

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Cited by 6 publications
(4 citation statements)
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“…They found that spreading is initially dominated by the impinging jet, but later resembles droplet spreading. 23,24 Additionally, researchers have investigated the effects of altering the surface of the substrate. Some have considered the effects of altering the geometry of the substrate, 11,25 although the present paper focuses on flat substrates.…”
Section: Introductionmentioning
confidence: 99%
“…They found that spreading is initially dominated by the impinging jet, but later resembles droplet spreading. 23,24 Additionally, researchers have investigated the effects of altering the surface of the substrate. Some have considered the effects of altering the geometry of the substrate, 11,25 although the present paper focuses on flat substrates.…”
Section: Introductionmentioning
confidence: 99%
“…The development of film thickness distributions during the injection stage depends on the wafer rotation speed, 4) injection rate, and injection time. Recently, numerical simulations of the continuous film spread and flow visualization on a commercial spin coater have been reported by Chou et al, 5) who found that controlling the injection time and increasing the injection rate can reduce the amount of liquid injected. However, no comprehensive study or data on injection rate or injection time was provided.…”
Section: Introductionmentioning
confidence: 99%
“…[6][7][8] At a given instant the rotation velocity rapidly increases, driving the radial spreading of the liquid. In the current microelectronics industry, a nozzle usually dispenses a stream of photoresist onto the surface of a high-spinningspeed wafer 5,9) to meet the requirement of high throughput and better uniformity. As the coating liquid spreads, a capillary ridge forms near the advancing contact line, and the liquid front becomes susceptible to azimuth perturbations, leading to finger deformation.…”
Section: Introductionmentioning
confidence: 99%
“…To effectively reduce the running cost of photoresist consumption, coating a maximum radius of liquid film with a minimum amount of liquid was studied. [1][2][3] However, the largest radius that a liquid film can cover is limited by the formation of instability rivulets or ''fingers'' at the leading edge of liquid front. The largest radius is also called critical radius (R c ), meaning the radius corresponding to the onset of fingering instability.…”
Section: Introductionmentioning
confidence: 99%