Reduction of water outgassing and UHV production in an unbaked vacuum chamber by neon gas discharge

Akaishi, K.; Ezaki, Kazuhiro; Kubota, Yūsuke; Motojima, O.

doi:10.1016/s0042-207x(98)00376-5

Cited by 5 publications

(3 citation statements)

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“…To improve the surface wettability, we developed an in situ pretreatment using a GDC that was performed at a pressure of 2.8 × 10 −2 Torr for 1 h. This cleaning step dissociates water molecules, forming OH radicals and H atoms [28,29]. The OH radicals remain on the surface in a strongly bound state, and only the hydrogen molecules are desorbed to the gas phase and pumped out of the chamber.…”

Section: Nanoparticle-covered Substratesmentioning

confidence: 99%

Homogeneous large-scale crystalline nanoparticle-covered substrate with high SERS performance

et al. 2015

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This article details the surface-enhanced Raman scattering (SERS) performance of plasmonic substrates fabricated by a physical metal evaporation technique that uses no precursor or intermediate coating. We outline a cost-effective nanofabrication protocol that uses common laboratory equipment to produce homogeneously covered crystalline nanoparticle substrates. Our fabrication yields a homogeneous SERS response over the whole surface. The platform is tested with methylene blue diluted at various concentrations to estimate the sensitivity, homogeneity, and reproducibility of the process. The capacity of the substrates is also confirmed with spectroscopic investigations of human microsomal cytochrome b5.

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Section: Nanoparticle-covered Substratesmentioning

confidence: 99%

Homogeneous large-scale crystalline nanoparticle-covered substrate with high SERS performance

et al. 2015

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“…Also, some H 2 O is chemisorbed on the surface of the MgO layer from 105 to 180°C by the hydrogen bonding with MgO and this chemisorbed H 2 O is known to be desorbed by increasing the temperature to 400°C. [9][10][11][12] In fact, some gas including H 2 O and other gas species can be trapped inside of the film and can be outgassed with the increase of time and temperature. In the case of rear glass, H 2 O partial pressure was increased as the temperature was raised to 100°C, but decreased very slowly with further increase of temperature.…”

Section: Resultsmentioning

confidence: 99%

Investigation of the outgassing characteristics of the materials comprising a plasma display panel

Han

Lee

Yeom

2001

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Long gas evacuation time before the introduction of the discharge gases into the panel is one of the major problems in the production of a plasma display panel ͑PDP͒. In this study, the outgassing characteristics during the panel evacuation stage were investigated using a quadrupole mass spectrometer. The origin of the impurity gas was studied by measuring the outgassed species from each layer comprising the PDP. Dominant species observed during the evacuation of the panel were H 2 , H 2 O, N 2 , O 2 , and CO 2 and water vapor was the most abundant species. When the outgassing characteristics of the panel were compared with the outgassing characteristics from each layer comprising the panel, the material most responsible for the water vapor turned out to be a MgO layer. The outgassing experiments of single panels have also shown that the long outgassing time of PDP is mostly related to the MgO layer and possibly also to red, green, and blue layers and white dielectric material coated on the each single panel. Therefore to reduce the gas evacuation time, controlled atmosphere appears to be required during the deposition of these materials and the storage of those deposited panels.

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“…Longterm panel aging must stabilizeˆring voltage 4) . Several reports have described that panel annealing at lower pressures is eŠective for decreasing theˆring voltage [9][10][11][12][13] . In the case of MgO, vacuum annealing increased the g value because of the surface cleaning eŠect 14) .…”

Section: Introductionmentioning

confidence: 99%

Panel Processing Effects on Discharge Characteristics of Plasma Display Panels

Yano¹,

Uchida²,

Shinoda

et al. 2012

J. Vac. Soc. Jpn.

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We developed a new PDP manufacturing method in which protective layer deposition and sealing were performed continuously in high vacuum (pressure range 10-6 Pa), to keep the protective layer surface as clean as possible (``all-in-vacuum''). Thè`a ll-in-vacuum'' panel shows high performance: 1) short aging time, 2) lowˆring voltage, and 3) short statistical time lag. Especially, the short statistical time lag is not obtained once the MgO layer is annealed in ambient air, even though the annealed MgO layer is activated in high vacuum.

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Reduction of water outgassing and UHV production in an unbaked vacuum chamber by neon gas discharge

Cited by 5 publications

References 0 publications

Homogeneous large-scale crystalline nanoparticle-covered substrate with high SERS performance

Homogeneous large-scale crystalline nanoparticle-covered substrate with high SERS performance

Investigation of the outgassing characteristics of the materials comprising a plasma display panel

Panel Processing Effects on Discharge Characteristics of Plasma Display Panels

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