2011
DOI: 10.1016/j.jcrysgro.2010.09.038
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Reflectance anisotropy spectroscopy assessment of the MOVPE nucleation of GaInP on germanium (1 0 0)

Abstract: This work summarizes the observations made on the variation and time evolution of the reflectance Kevwordsanisotropy signal during the MOVPE growth of GalnP nucleation layers on Germanium substrates. This Al Reflectance anisotropy spectroscopy ' n s '' u monitoring tool is used to assess the impact of different nucleation routines and reactor Al. Growth monitoring conditions on the quality of the layers grown. This comparison is carried out by establishing a A2. Metalorganic vapor phase epitaxy correlation bet… Show more

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Cited by 23 publications
(24 citation statements)
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“…Two different growth temperatures (640 and 675°C) were used to grow these III‐V layers, to test their effects on the emitter formation and its performance, and the growth time was around 45 minutes in all cases. Details on the growth can be found elsewhere …”
Section: Experimental and Modellingmentioning
confidence: 99%
See 1 more Smart Citation
“…Two different growth temperatures (640 and 675°C) were used to grow these III‐V layers, to test their effects on the emitter formation and its performance, and the growth time was around 45 minutes in all cases. Details on the growth can be found elsewhere …”
Section: Experimental and Modellingmentioning
confidence: 99%
“…Details on the growth can be found elsewhere. 4 Triple junction solar cell solar cells were also grown by using the same nucleation conditions (materials, growth temperature, and Ge wafer resistivity). Table 1 includes information about the growth temperatures and time employed during the growth of the 3JSCs, and more generic details about these 3JSC structures can be found elsewhere.…”
mentioning
confidence: 99%
“…Particularly, P termination of the Ge surface should be obtained prior to nucleation for state-of-the-art GalnP on Ge heteroepitaxy in MOVPE [10,11]. Phosphine (PH 3 ) and tertiarybutylphosphine (TBP) are nowadays the two main P precursors used in MOVPE systems.…”
Section: Introductionmentioning
confidence: 99%
“…The hydrogen coverage of the Ge surface during processing in H 2 ambient represents a dynamic balance of hydrogen adsorption and desorption events depending on the process parameters such as temperature and hydrogen pressure. Accordingly, Ge(100) is H‐free in H 2 process gas ambient at a H 2 pressure of 100 mbar for temperatures above 370 °C, and thus corresponding process conditions are typically used for III/V nucleation (420–750 °C, 50–100 mbar H 2 pressure) . In contrast to Si(100), there is no indication for etching processes induced by the H 2 interaction.…”
Section: Epitaxial Reference Surfacesmentioning
confidence: 99%