is key for many industries such as microelectronics, telecommunications, defense, microfluidics but also for biological applications. The techniques for making such objects are diverse, but traditionally based on linear patterning that involves the use of molds or masks. [1] Electron beam lithography (EBL) is mainly used for prototyping or making molds for replications.Innovative processes for the direct 3D fabrication of sample with a complex shape at a sub-microscale are nowadays required. For the past 20 years, a manufacturing technique was developed, multiphotonic lithography, also called direct laser writing (DLW). [2] Direct laser writing can have very fast speeds (hundreds of m s -1 ) for writing 2D structures on functional surfaces. This work has objectives to contribute to develop a massive parallelization process with millions of laser spots. Thus, direct laser writing could be used directly for the 3D nanostructuration of functional surfaces, in particular on detector windows (antifogging), CMOS wafers, biological surfaces. This technique, similar to some extent to stereolithography, allows the preparation of solid materials from liquid photosensitive resins by laser-induced photopolymerization. The polymerization isThe ORCID identification number(s) for the author(s) of this article can be found under https://doi.org/10.1002/smll.202102486.