2021
DOI: 10.33581/2520-2243-2021-1-73-81
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Regimes of substrates processing and deposition nanofilms using the laser-plasma method

Abstract: The physical processes occurring in a laser-plasma source is used for deposition nanostructures. The laser-plasma source is an erosion laser plume of the target material and a substrate located in a vacuum chamber. It has been proposed to place a grid between the laser target and the substrate. A negative potential is applied to the grid relative to the laser target to smoothly adjust the parameters of the particles deposited on the substrate. As a result, a particles flow is formed after a grid. This particle… Show more

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“…To obtain the required characteristics of nanofilms, it is necessary to study the features of the destruction of the laser target material in a vacuum, to determine the number of ionized and excited atoms in the plasma, the dynamics of the parameters of the erosion laser torch and its spatial characteristics. The composition of the plasma-erosion torch affects the characteristics of thin films, allows you to control the composition of the preciphered coatings [2][3].…”
Section: Introductionmentioning
confidence: 99%
“…To obtain the required characteristics of nanofilms, it is necessary to study the features of the destruction of the laser target material in a vacuum, to determine the number of ionized and excited atoms in the plasma, the dynamics of the parameters of the erosion laser torch and its spatial characteristics. The composition of the plasma-erosion torch affects the characteristics of thin films, allows you to control the composition of the preciphered coatings [2][3].…”
Section: Introductionmentioning
confidence: 99%