Relationship between surface free energy and development process (swelling and dissolution kinetics) of poly(4-hydroxystyrene) film in water and 2.38 wt% tetramethylammonium hydroxide aqueous solution

Advances in Patterning Materials and Processes XL

et al. 2023

For the advancement of lithography, the resist materials and processes are the most critical issue in the microfabrication of semiconductors. Especially in the sub-20 nm half pitch resolution region, the development process of resist materials is of particular importance from the viewpoint of reducing the line width roughness (LWR) and stochastic defects. In this study, a quartz crystal microbalance (QCM) method was used to investigate the dissolution dynamics of poly(4-hydroxystyrene) (PHS) films containing triphenylphosnium-nonaflate (TPS-nf) in tetraalkylammonium hydroxide aqueous solutions. The comparison of dissolution dynamics in five different developer solutions with different alkyl chain lengths was done.

Section: Resultsmentioning

confidence: 99%

Effects of photoacid generator decomposition on dissolution kinetics of poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solutions

Iwashige

Advances in Patterning Materials and Processes XL

et al. 2023

“…The increase in impedance change is considered to indicate the increase in polymer concentration near the polymer film surface because the observed dissolution kinetics are typical for the dissolution in Case II diffusion. [25][26][27][28][29] The maximum impedance change decreased with increasing protection ratios. This decrease indicates the decrease in solubility due to the increase in protection ratio.…”

Section: Methodsmentioning

confidence: 97%

Dissolution dynamics of partially protected poly(4-hydroxystyrene) in tetraalkylammonium hydroxide aqueous solution

Betsumiya

et al. 2023

Jpn. J. Appl. Phys.

Self Cite

A 0.26 M tetramethylammonium hydroxide (TMAH) aqueous solution has been used as a standard developer for manufacturing semiconductor devices. Alternative developers have recently attracted much attention because the 0.26 M TMAH developer may be approaching its performance limit. In this study, we measured the dissolution and swelling behavior of resist polymers in tetraalkylammonium hydroxide (TAAH) aqueous solutions using a quartz crystal microbalance method to clarify the effects of the alkyl chain length of TAAH. The resist polymer was poly(4-hydroxystyrene), whose hydroxyl groups were partially protected with t-butoxycarbonyl groups. When the alkyl chain length of TAAH was increased from two (ethyl) to three (propyl), the dissolution mode markedly changed. The dissolution mode did not depend on the polymer polarity. The change of the dissolution mode is probably caused by the size effect of TAAH, considering the independence of polymer polarity and the discrete change of the dissolution mode.

“…It is also important to understand the fundamentals of development and rinse processes to improve the development processes. [2][3][4] Thus, in this study, we measured the dissolution and swelling behavior of tetraalkylammonium hydroxide (TAAH) aqueous solutions in resist polymers using a quartz crystal microbalance (QCM) method. The resist polymer was poly(4-hydroxystyrene) (PHS), the hydroxyl groups of which were partially protected with t-butoxycarbonyl groups.…”

Section: Introductionmentioning

confidence: 99%

Dependence of swelling and dissolution kinetics of poly(4-hydroxystyrene) in alkaline aqueous solution on alkyl chain length of tetraalkylammonium hydroxide

Betsumiya

Advances in Patterning Materials and Processes XL

et al. 2023

Recently chemically amplified resists are approaching their performance limits due to the fixed development process. In this study, the dissolution, swelling, and impedance change of resist polymers were measured by a development analyzer with a quartz crystal microbalance method. The resist polymer was poly(4-hydroxystyrene) (PHS), the hydroxyl groups of which were partially protected with t-butoxycarbonyl groups. The alkyl chain lengths of tetraalkylammonium hydroxide were varying from methyl to pentyl groups. When the alkyl chain length of TAAH increased from two to three, the dissolution mode markedly changed.