2002
DOI: 10.1016/s0168-583x(02)00686-9
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Release properties of UCx and molten U targets

Abstract: The release properties of UC x and molten U thick targets associated with a Nier-Bernas ion source have been studied. Two experimental methods are used to extract the release time. Results are presented and discussed for Kr, Cd, I and Xe. PACS: 29.25.Rm, 25.85.Ec, 29.30.Kv

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Cited by 24 publications
(5 citation statements)
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“…In the case of ISOL facilities, the main technical difference affecting spallation reactions induced on a thick 238 U target, is the extraction efficiency from the target. In principle, uranium composites present good release properties [43]. However, as already mentioned, the refractory nature of the elements of interest results in extremely low extraction efficiencies [44,45,46].…”
Section: B Benchmarking Of Model Calculationsmentioning
confidence: 99%
“…In the case of ISOL facilities, the main technical difference affecting spallation reactions induced on a thick 238 U target, is the extraction efficiency from the target. In principle, uranium composites present good release properties [43]. However, as already mentioned, the refractory nature of the elements of interest results in extremely low extraction efficiencies [44,45,46].…”
Section: B Benchmarking Of Model Calculationsmentioning
confidence: 99%
“…The distribution of iodine between liquid metal and gas phase in a liquid bismuth loop has been determined under helium atmosphere at 773 K [4]. The release of iodine from liquid lanthanum and uranium in ISOL targets has been studied [5][6][7][8]. Iodine release from liquid sodium was investigated in connection with LMFBR technology [9,10].…”
Section: Introductionmentioning
confidence: 99%
“…Assuming that the predominant release mechanism is effusion in case of tin and diffusion in case of xenon, the measurement and the analysis have been carried out as indicated in refs. [6,7]. Preliminary results indicate T R ≈ 40 s for tin and T R ≈ 20 s for xenon.…”
Section: The Release Times (Spiral 2 and Alto)mentioning
confidence: 97%