2009 Design, Automation &Amp; Test in Europe Conference &Amp; Exhibition 2009
DOI: 10.1109/date.2009.5090673
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Reliability aware through silicon via planning for 3D stacked ICs

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Cited by 17 publications
(7 citation statements)
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“…The enhanced packing densities facilitated by 3D integrated circuit technology also have an unwanted side-effect, in the form of increasing the amount of current per unit footprint of the chip, as compared to a 2D design [3]. From the experimental results it is observed that a single TSV failure could increase the maximum voltage variation up to 70% in nano-scale ICs [4]. A 3D chip with n tiers can only have 1/n the number of power supply pins compared to its 2D counterpart which results in n fold increase in the resistive and inductive parasitic [5].…”
Section: Introductionmentioning
confidence: 89%
“…The enhanced packing densities facilitated by 3D integrated circuit technology also have an unwanted side-effect, in the form of increasing the amount of current per unit footprint of the chip, as compared to a 2D design [3]. From the experimental results it is observed that a single TSV failure could increase the maximum voltage variation up to 70% in nano-scale ICs [4]. A 3D chip with n tiers can only have 1/n the number of power supply pins compared to its 2D counterpart which results in n fold increase in the resistive and inductive parasitic [5].…”
Section: Introductionmentioning
confidence: 89%
“…It is a Reliability Computer Aided Design (RCAD) tool that is a capable of comparison of 2D and 3D circuit layouts. Similar to study of Alam et al, Shayan et al proposed a framework to analyze the reliability of 3D power distribution network under local through silicon via failures [17]. The 3D power distribution network is extracted and modeled in frequency domain considering skin effect.…”
Section: Related Workmentioning
confidence: 99%
“…The silicon substrate is usually of low resistivity in digital ICs and this will lead to silicon substrate propagation during power delivery and as a result noise. To the best of the authors knowledge, none of the previous work on 3D power distribution [4], [1], [7], modeled and considered the impact of substrate coupling in power noise. One challenge that is introduced as a result of three dimensional stacking is parasitic interactions through the shared silicon substrate and among TSVs.…”
Section: D Pdn Model With Substrate Couplingmentioning
confidence: 99%
“…Shayan et al in [4], presented a reliability aware TSV planning considering thermo-mechanical stress. We adopt the methodology in [4] and proposed model for the substrate coupling and analyzed the impact of frequency dependent TSV and substrate parasitics on the voltage variation.…”
Section: Introductionmentioning
confidence: 99%
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