“…The most commonly used process is wire bonding by metallization [ e.g ., electroplating, chemical plating, physical vapor deposition (PVD), chemical vapor deposition (CVD), and a radio frequency (RF) sputtering method, etc.) to achieve stable connection in the electronic package 12–14. The Cu electroplating for wire bonding presents several advantages, including significant cost saving, higher electrical and thermal conductivity, weaker electromagnetic effect, and superior mechanical properties, importantly, it could effectively avoid the leading‐in stress and decrease the influence of stress anisotropy on impedance 10, 15.…”