2008
DOI: 10.1002/pssc.200778455
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Remarkable improvement in output power for an InAlGaN based ultraviolet LED by improving the crystalline quality of AlN/AlGaN templates

Abstract: The use of quaternary InAlGaN is very attractive for the realization of commercially‐available low‐cost and high‐power ultraviolet light‐emitting diodes (UV‐LEDs), because highly‐efficient UV emission can be obtained from this material due to In‐segregation effects. We achieved remarkable improvements in output power from 340 nm‐band quaternary InAlGaN‐based UV‐LEDs and demonstrated high UV‐output power by using high‐quality AlN buffer templates on sapphire substrates. Threading dislocation densities (TDDs) fo… Show more

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Cited by 5 publications
(2 citation statements)
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“…In the case of the (10-12) XRC, the FWHM increased from 510 arcsec to 580 arcsec away from the center of the wafer. In the cases where AlGaN/AlGaN and InAlGaN/InAlGaN MQWs were used for UV region, the PL intensities were dramatically increased by improving the FWHMs to 500 arcsec [2,14]. On the other hand, the FWHM of the (0002) XRC was slightly increased from 170 arcsec to 190 arcsec.…”
mentioning
confidence: 88%
“…In the case of the (10-12) XRC, the FWHM increased from 510 arcsec to 580 arcsec away from the center of the wafer. In the cases where AlGaN/AlGaN and InAlGaN/InAlGaN MQWs were used for UV region, the PL intensities were dramatically increased by improving the FWHMs to 500 arcsec [2,14]. On the other hand, the FWHM of the (0002) XRC was slightly increased from 170 arcsec to 190 arcsec.…”
mentioning
confidence: 88%
“…In this context recently various studies have been realized such as the using of the low-temperature barriers to improve strain relaxation and high performance GaN based LEDs where the authors success to increase the strain-relaxed mechanism of low-temperature barriers and address this problem [8][9][10][11][12] . Maximum output power and external quantum efficiency were obtained by employing 222-282 nm AlGaN and InAlGaN-based deep UV LEDs fabricated on low threading dislocation density AlN template [13] , and different growth methods were proposed to obtain AlGaN/AlN templates to obtain low threading dislocation density (TDD) [12-14, ] .…”
Section: Introductionmentioning
confidence: 99%