2022
DOI: 10.4265/bio.27.217
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Remote Bactericidal Effect of Anatase TiO<sub>2</sub> Photocatalytic Nanoparticles Annealed with Low-Temperature O<sub>2</sub> Plasma

Abstract: The remote bactericidal effect of TiO 2 photocatalyst, i.e., the bactericidal effect away from the photocatalyst, was successfully achieved using a humidified airflow. The TiO 2 photocatalyst used was anatase-type TiO 2 nanoparticles (NPs) annealed with a low-temperature O 2 plasma. For comparison, anatase-type TiO 2 NPs annealed in the air were used. The bacteria, Bacillus subtilis, were placed away from the TiO 2 NPs. The plasma-assisted-annealed TiO 2 NPs significantly inactivated 99% of the bacterial cells… Show more

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Cited by 4 publications
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“…Kawakami, R. et al prepared anatase-type TiO2 photocatalysts using low-temperature O-2 plasma combined with TiO photocatalysts and analyzed the data for the catalysts. The results showed that the photocatalyst was able to achieve a long-range sterilization effect in humidified gas streams, which promotes the application field of low-temperature plasma technology [19]. Ilhom, S. et al analyzed the growth of low-temperature plasma technology on silicon, sapphire, and crystalline thin films on glass and used the data for experimental analysis, which showed that the growth period of low-temperature plasma thin films cycled between 0.69 and 1.31 [20].…”
Section: ) Low-temperature Plasma Technologymentioning
confidence: 93%
“…Kawakami, R. et al prepared anatase-type TiO2 photocatalysts using low-temperature O-2 plasma combined with TiO photocatalysts and analyzed the data for the catalysts. The results showed that the photocatalyst was able to achieve a long-range sterilization effect in humidified gas streams, which promotes the application field of low-temperature plasma technology [19]. Ilhom, S. et al analyzed the growth of low-temperature plasma technology on silicon, sapphire, and crystalline thin films on glass and used the data for experimental analysis, which showed that the growth period of low-temperature plasma thin films cycled between 0.69 and 1.31 [20].…”
Section: ) Low-temperature Plasma Technologymentioning
confidence: 93%