2019
DOI: 10.1063/1.5095550
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Remotely induced high-density hollow-anode plasma and its application to fast deposition of photosensitive microcrystalline silicon thin film with preferential <110> orientation

Abstract: We investigated the application of a less hydrogen-dilute and low gas pressure hollow-anode plasma to fast chemical-vapor deposition of photosensitive hydrogenated microcrystalline silicon (μc-Si:H). The hollow-anode plasma was remotely induced at a processing space by transferring a hollow-cathode plasma through a nozzle attached to a partition plate, which operated as an anode and separated the processing space from a hollow-cathode discharge space in an ultrahigh-vacuum hollow-electrode-enhanced glow-plasma… Show more

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