Removal of CF4 from NF3 at the phase interface

Cholach, A. R.; Yakovin, Dmitri

doi:10.1016/j.jtice.2021.104178

Cited by 5 publications

(2 citation statements)

References 28 publications

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“…The removal of CF 4 impurities in NF 3 products is not only crucial in the dry etching process but also beneficial to environmental sustainability. However, the removal of CF 4 is a difficult task due to its high chemical inertness and the similar compound properties to NF 3 . At present, the separation methods used in industry are mainly distillation , and adsorption.…”

Section: Introductionmentioning

confidence: 99%

“…However, the removal of CF 4 is a difficult task due to its high chemical inertness and the similar compound properties to NF 3 . 3 At present, the separation methods used in industry are mainly distillation 1,4 and adsorption. The azeotropic distillation method is applicable for large-scale production but it has fatal disadvantages including complicated operations and energy-intensive problems.…”

Section: Introductionmentioning

confidence: 99%

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Theoretical Design of MOFs and PSA Process for Efficient Separation of CF₄/NF₃

Zhang

Liu

et al. 2023

Ind. Eng. Chem. Res.

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Nitrogen trifluoride (NF 3 ) is a kind of electronic specialty gas used as an etchant for the production of semiconductor chips. However, trace amounts of CF 4 impurities in the NF 3 product have seriously limited its application. In this work, high-throughput calculations were used to efficiently screen the metal−organic frameworks (MOFs) with excellent CF 4 -selective adsorption performance based on the 796 MOFs from the CoRE MOF database and 10 top-performing materials were identified, in which JUCXEK stands out with the highest CF 4 selectivity of 50.15. We designed JUCXEK material by changing the metal sites, and Zr-JUCXEK was found to be the most promising material used in industry. The pressure swing adsorption (PSA) process simulation using Zr-JUCXEK as the adsorbent was further designed to verify its industrial values. The CF 4 outlet concentration and NF 3 recovery meet the industrial requirement, indicating that Zr-JUCXEK possesses the ability to remove CF 4 and obtain highquality NF 3 products.

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Section: Introductionmentioning

confidence: 99%