2004
DOI: 10.1116/1.1815300
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Repair of step and flash imprint lithography templates

Abstract: In order for step and flash imprint lithography (S-FIL) to become a truly viable manufacturing technology, infrastructure including template repair must be commercially available. Extensive template repair studies were undertaken using RAVE's nm 650 tool which is predicated on an AFM platform and relies upon a nanomachining technique for opaque defect removal. On S-FIL templates, the standard deviation for depth repairs in quartz from the target depth was found to be 3.1 nm ͑1͒. At 21.5 nm ͑1͒, the analogous s… Show more

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Cited by 9 publications
(9 citation statements)
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“…The AFM platform is used to image the defect and repair it. This work demonstrated subtractive repair of protrusions 300 nm in size; trenches as small as 50 nm were cut in raised silica features (5).…”
Section: Introductionmentioning
confidence: 98%
“…The AFM platform is used to image the defect and repair it. This work demonstrated subtractive repair of protrusions 300 nm in size; trenches as small as 50 nm were cut in raised silica features (5).…”
Section: Introductionmentioning
confidence: 98%
“…For nano-imprint lithography to be accepted across the industry, a new infrastructure for 1X template fabrication 0167-9317/$ -see front matter Ó 2007 Elsevier B.V. All rights reserved. doi:10.1016/j.mee.2006.11.013 [4], inspection [5], and repair [6] needs to be established. This is a challenge.…”
mentioning
confidence: 99%
“…The tip can apply a variety of forces, including contact, magnetic, thermal, and electrical using modified tips. It has been used in lithography [48], [49], in nanomanipulation [50]- [53], and in nanoassembly [2], [54], [55]. Another interesting application is the "millipede" project at IBM Research [56], [57].…”
Section: A Brief Sampling Of Afm Applicationsmentioning
confidence: 99%