Atomically thin semiconductors
are of interest for future electronics
applications, and much attention has been given to monolayer (1L)
sulfides, such as MoS
2
, grown by chemical vapor deposition
(CVD). However, reports on the electrical properties of CVD-grown
selenides, and MoSe
2
in particular, are scarce. Here, we
compare the electrical properties of 1L and bilayer (2L) MoSe
2
grown by CVD and capped by sub-stoichiometric AlO
x
. The 2L channels exhibit ∼20× lower
contact resistance (
R
C
) and ∼30×
larger current density compared with 1L channels.
R
C
is further reduced by >5× with AlO
x
capping, which enables improved transistor current
density. Overall, 2L AlO
x
-capped MoSe
2
transistors (with ∼500 nm channel length) achieve
improved current density (∼65 μA/μm at
V
DS
= 4 V), a good
I
on
/
I
off
ratio of >10
6
, and
an
R
C
of ∼60 kΩ·μm.
The
weaker performance of 1L devices is due to their sensitivity to processing
and ambient. Our results suggest that 2L (or few layers) is preferable
to 1L for improved electronic properties in applications that do not
require a direct band gap, which is a key finding for future two-dimensional
electronics.