Research of Constructive and Technological Methods for Forming a Silicon Disk Resonator with Whispering Gallery Modes

Yakuhina, Anastasia; Kadochkin, A. S.; Amelichev, V. V.; Gorelov, Dmitry; Generalov, S. S.

doi:10.3390/photonics7020031

Cited by 1 publication

(4 citation statements)

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“…Previously, we presented a method for forming a silicon disk resonator with a wedge-shaped profile. The schematic of its cross-section is shown in Figure 8 [19].…”

Section: Results Of the Surface Roughness Of The Wgm Resonator Manufa...mentioning

confidence: 99%

“…It was about 30-40 nm. The method of creating such a resonator was described earlier [19], and it involves the use of plasma-chemical etching to form the desired profile.…”

Section: Results Of the Surface Roughness Of The Wgm Resonator Manufa...mentioning

confidence: 99%

“…One of the main criteria in the development of a method for creating an ultrahigh-Q silicon disk resonator is the need for its implementation using silicon technologies and group-processing methods. The choice of design parameters, such as the value of the "undercut", ''legs'' and the angle of the wedge-shaped profile, was based on previous studies [19,20]. Figure 1 shows the schematic of the profile of the developed structure.…”

Section: Fabricationmentioning

confidence: 99%

“…Environment is air. h si , the thickness (height) of the wedge-shaped waveguide; h SiO2 , thickness (height) of the dielectric layer; d 1 , distance from the edge of the wedge to the beginning of the oxide beam (support); d 2 , the gap between the edge of the wedge-shaped waveguide and the Si substrate; a, wedge angle[19].…”

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Influence of the Surface Roughness of a Silicon Disk Resonator on Its Q-Factor

et al. 2021

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This article presents a silicon disk resonator of the whispering-gallery-mode (WGM) type. The calculated Q-factor of the silicon WGM resonator was 107. Two methods of studying the surface roughness of a silicon WGM resonator with a nonlinear profile by means of Helios 650 scanning electron microscope and Bruker atomic force microscope (AFM) are presented. The results obtained by the two methods agreed well with each other. A comparison of the surface roughness values of WGM resonators manufactured using different technological approaches is presented. Based on the obtained data, a preliminary estimated Q-factor calculation of the resonators was performed, which was refined by numerical calculation using the finite-difference time-domain (FDTD) method. The effect of the surface roughness of the resonator on its Q-factor was found. Reducing the surface roughness of the resonator from 30 nm to 1–2 nm led to an increase in its Q-factor from 104 to 107.

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“…Previously, we presented a method for forming a silicon disk resonator with a wedge-shaped profile. The schematic of its cross-section is shown in Figure 8 [19].…”

Section: Results Of the Surface Roughness Of The Wgm Resonator Manufa...mentioning

confidence: 99%

“…It was about 30-40 nm. The method of creating such a resonator was described earlier [19], and it involves the use of plasma-chemical etching to form the desired profile.…”

Section: Results Of the Surface Roughness Of The Wgm Resonator Manufa...mentioning

confidence: 99%

Section: Fabricationmentioning

confidence: 99%

mentioning

confidence: 99%

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