2020
DOI: 10.3390/mi11090789
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Research of Wafer Level Bonding Process Based on Cu–Sn Eutectic

Abstract: In 3D-system packaging technologies, eutectic bonding is the key technology of multilayer chip stacking and vertical interconnection. Optimized from the aspects of the thickness of the electroplated metal layer, the pretreatment of the wafer surface removes the oxide layer, the mutual alignment between the wafers, the temperature of the wafer bonding, the uniformity of pressure and the deviation of the bonding process. Under the pretreatment conditions of plasma treatment and citric acid cleaning, no oxide lay… Show more

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Cited by 13 publications
(8 citation statements)
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“…TSV-based 3D stacking technology is proven to enable very-high-bandwidth and low-latency memory processor interconnects [ 42 ], and the resulting system is well suited for high throughput applications. For example, Kgil et al proposed a server called PicoServer, which utilizes 3D stacking to interstack a logic chip with multiple DRAM memory chips [ 43 ], as shown in Figure 6 .…”
Section: Chiplet-based Processing-in-memory Architecturementioning
confidence: 99%
“…TSV-based 3D stacking technology is proven to enable very-high-bandwidth and low-latency memory processor interconnects [ 42 ], and the resulting system is well suited for high throughput applications. For example, Kgil et al proposed a server called PicoServer, which utilizes 3D stacking to interstack a logic chip with multiple DRAM memory chips [ 43 ], as shown in Figure 6 .…”
Section: Chiplet-based Processing-in-memory Architecturementioning
confidence: 99%
“…In the case of the bonding layer, plating and deposition processes have been applied using various binary materials, such as Au-Sn, Cu-Sn, etc., and low-temperature processes and low-priced bonding materials are needed for mass production [ 5 , 6 ]. Recently, Cu-Sn, which is relatively cheap, has been widely used, and various thermal treatment methods in which microstructures were obtained have been reported, leading to increases in reliability [ 7 , 8 , 9 , 10 , 11 , 12 ]. Kumar S. et al reports Matano plane-based diffusion model Cu-Sn diffusion couples [ 7 ].…”
Section: Introductionmentioning
confidence: 99%
“…Using the linear expansion method of Crack Tip Opening Displacement (CTOD), the relationship between geometric factors and crack length was determined, and a function equation to calculate the critical crack length of the fracture test was obtained. Wenchao Tian et al proposed a wafer-level, high-density microbump bonding technology and optimized the thickness, structure and layout of bonding materials by comparing and selecting good bonding processes [8][9][10]. Finally, they realized low-resistant electrical performance connections and obtained higher reliability, which is very useful for improving the reliability of 3D-system packaging.…”
Section: Introductionmentioning
confidence: 99%