Research on platinum film resistance temperature sensing method

Abstract

As one of the seven basic units in the International System of Units (SI), the temperature quantity is also the most important physical parameter of the ocean. The development of high-performance temperature sensing technology methods and sensors to achieve high-precision measurement of ocean temperature and compensation of elemental parameters is an important guarantee to improve ocean monitoring technology and promote the development of ocean resources. In this paper, we use mask lithography method combined with magnetron sputtering method to study the effect of microstructure size parameters of platinum film resistors on their temperature sensing performance, such as temperature coefficient, measurement accuracy, etc. This experiment simply and accurately determines the effect of the length and width of the resistor wire on the measurement error and temperature coefficient (TCR) of the platinum film resistor, and achieves the preparation of high precision and high stability platinum film resistors by controlling the structural parameters of the platinum film resistor wire.