The discovery of
ferroelectricity in doped HfO2 in 2011
gave rise to quite a stir in the scientific world that persists up
to this day. The complementary metal oxide semiconductor compatibility,
as well as good scalability, enables versatile applications ranging
from ferroelectric field effect transistors to ferroelectric tunnel
junctions and neuromorphic devices. Stabilizing the metastable polar
orthorhombic phase with space group Pca21-phase, which is responsible for the ferroelectricity in HfO2, is still challenging. We demonstrate for the first time
a sputter deposition of undoped ferroelectric HfO2 on superconducting
NbN electrodes, with a remanent polarization of 6.4 μC/cm2. Grazing incident X-ray diffraction on the layer structure,
dynamic hysteresis measurements, and electron energy loss spectroscopy
on fabricated devices indicate a HfO2 layer with low oxygen
deficiency. Furthermore, no evidence of interdiffusion of oxygen or
nitrogen at the interfaces is found. A sudden “wake-up”
for the transition from the dielectric state to the ferroelectric
state as well as no classical fatigue effect for the degradation of
the ferroelectric performance are observed. These analyses are extended
by an investigation of Rayleigh behavior using impedance spectroscopy.
In that way, the domain wall flexibility is quantified and classified
within different regimes of the various domain wall motions.