2022
DOI: 10.1002/adma.202205381
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Reservoir Computing with Charge‐Trap Memory Based on a MoS2 Channel for Neuromorphic Engineering

Abstract: Novel memory devices are essential for developing low power, fast, and accurate in‐memory computing and neuromorphic engineering concepts that can compete with the conventional complementary metal−oxide−semiconductor (CMOS) digital processors. 2D semiconductors provide a novel platform for advanced semiconductors with atomic thickness, low‐current operation, and capability of 3D integration. This work presents a charge‐trap memory (CTM) device with a MoS2 channel where memory operation arises, thanks to electr… Show more

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Cited by 43 publications
(26 citation statements)
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References 45 publications
(59 reference statements)
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“…Moreover, trapping effects based on defects at the interface have been reported. , As shown in Figure j, Islam et al fabricated a 3T synaptic device based on the structure of monolayer MoS 2 /SiO 2 . The Si substrate was regarded as the gate of the device.…”
Section: Synaptic Devices Based On 2d Materialsmentioning
confidence: 99%
See 2 more Smart Citations
“…Moreover, trapping effects based on defects at the interface have been reported. , As shown in Figure j, Islam et al fabricated a 3T synaptic device based on the structure of monolayer MoS 2 /SiO 2 . The Si substrate was regarded as the gate of the device.…”
Section: Synaptic Devices Based On 2d Materialsmentioning
confidence: 99%
“…On this basis, synaptic functions, such as LTP/LTD, were successfully mimicked in response to optical and electrical stimulations (Figure l). Similarly, Farronato et al introduced a 3T synaptic transistor based on MoS 2 /SiO 2 . The working mechanism was based on electron trapping/de-trapping at the interface between MoS 2 /SiO 2 .…”
Section: Synaptic Devices Based On 2d Materialsmentioning
confidence: 99%
See 1 more Smart Citation
“…2h) consists of a transistor device with a 2D semiconductor material for the channel layer [85]- [87]. The memory behavior can be obtained by migration of dislocations in polycrystalline MoS 2 [88], lateral migration of Ag across the source/drain electrodes [85], or chargetrapping [89]. In some cases, MoS 2 memtransistors display gradual weight-update characteristics that are useful for reservoir computing [89] and training accelerators [90].…”
Section: Computational Memory Technologiesmentioning
confidence: 99%
“…Weight update requires linearity and symmetry of the conductance update under the application of a sequence of identical pulses, in line with the backpropagation algorithm. The best candidate materials to yield a linear weight update are ECRAM devices [125] and MoS 2 -based charge-trap memory [89], [90].…”
Section: A Applications Of Imc Mvm Acceleratorsmentioning
confidence: 99%