Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-Ray Diffraction

Geist, Daniel E.; Perry, A.J.; Treglio, James R.; Valvoda, V.; Rafaja, David

doi:10.1007/978-1-4615-1797-9_54

Cited by 25 publications

(15 citation statements)

References 22 publications

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“…Thus, a T* value of unity signifies a random orientation, whilst for T* values greater than unity the plane is considered to have a preferred orientation. Glancing angle parallel beam geometry was used to determine the state of residual stress present in the coatings 32 . For cubic structures the lattice parameters, ahkl (ψ) can be calculated for each diffraction peak where ψ is the angle between the diffraction vector of plane {hkl} and the normal to the film surface, such that ψ = θ -γ where θ is the Bragg angle and γ is the angle of incidence of the x-ray beam relative to the specimen surface.…”

Section: B Characterization Of Tialn/vn Coatingsmentioning

confidence: 99%

Transmission Electron Microscopy and X-ray Diffraction Investigation of the Microstructure of Nanoscale Multilayer TiAlN/VN Grown by Unbalanced Magnetron Deposition

et al. 2004

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Cubic NaCl-B1 structured multilayer TiAlN/VN with a bi-layer thickness of approximately 3 nm and atomic ratios of (Ti+Al)/V = 0.98 to 1.15 and Ti/V = 0.55 to 0.61 were deposited by unbalanced magnetron sputtering at substrate bias voltages between -75 and -150 V. In this paper, detailed transmission electron microscopy and x-ray diffraction revealed pronounced microstructure changes depending on the bias. At the bias -75 V, TiAlN/VN followed a layer growth model led by a strong (110) texture to form a T-type structure in the Thornton structure model of thin films, which resulted in a rough growth front, dense columnar structure with inter-column voids, and low compressive stress of -3.8 GPa. At higher biases, the coatings showed a typical Type-II structure following the strain energy growth model, characterized by the columnar structure, void-free column boundaries, smooth surface, a predominant (111) texture, and high residual stresses between -8 and -11.5 GPa.

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Section: B Characterization Of Tialn/vn Coatingsmentioning

confidence: 99%

Transmission Electron Microscopy and X-ray Diffraction Investigation of the Microstructure of Nanoscale Multilayer TiAlN/VN Grown by Unbalanced Magnetron Deposition

et al. 2004

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“…18 Amorphization has been reported to occur after ion implantation of PVD TiN, 19,20 whereas no such response has been seen for CVD material implanted with a range of ions. 12,21,22 Since amorphization due to ion bombardment occurs in response to the accumulation of the damage produced (e.g., the formation of vacancies and interstitials by the displacement of target atoms) this is consistent with the lower baseline defect levels present in CVD coatings. However, it must be questioned whether it is possible to amorphize a material such as TiN in which the bonding is substantially metallic.…”

Section: Introductionmentioning

confidence: 54%

“…11 CVD films have a relatively rough surface (Ra ∼ 2m) and a low tensile residual stress (typically <1 GPa), microstrain broadening, and defect concentration within individual grains. 4,12,13 In contrast, PVD deposition technologies allow the deposition of columnar, zone-T coatings 11 at temperatures lower than 500°C. These coatings tend to be very smooth, with roughness almost the same as the untreated substrate (except for some cathodic arc coatings where macrodroplet formation leads to an increase in roughness 14 ).…”

Section: Introductionmentioning

confidence: 99%

“…These coatings tend to be very smooth, with roughness almost the same as the untreated substrate (except for some cathodic arc coatings where macrodroplet formation leads to an increase in roughness 14 ). However, they generally possess a large compressive residual stress (approximately 6 GPa 12,13,15 ), and individual grains contain a large number of defects leading to high microstrain broadening. Nitrogen ion implantation will generally increase these defect levels for both types of coating (e.g., Ref.…”

Section: Introductionmentioning

confidence: 99%

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Mechanism of improvement of TiN-coated tool life by nitrogen implantation

et al. 2001

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The life of TiN-coated tools can be improved by a post-coating ion implantation treatment, but the mechanism by which this occurs is still not clear. Nitrogen implantation of both physical-vapor-deposited TiN and CVD TiN leads to surface softening as the dose increases, which has been attributed to amorphization. In this study a combination of transmission electron microscopy and atomic force microscopy was used to characterize the microstructure of implanted TiN coatings on cemented carbide for comparison with mechanical property measurements (nanoindentation, residual stress, etc.), made on the same samples. Ion implantation leads to a slight reduction in the grain size of the TiN in the implanted zone, but there is no evidence for amorphization. Surface softening is observed for physical-vapor-deposited TiN, but this is probably due to a combination of changes in surface composition and the presence of a layer of bubbles generated by the very high implantation doses used.

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“…This feature is inevitable for study of residual stresses in thin films. [5] Microscopic structure of UN thin films: The most important microstructure characteristics are the interatomic distances, as they directly influence the electronic structure. The interatomic distances are determined by the crystal structure and by the lattice parameters.…”

Section: Functional Cubic Thin Films ð a Structure Viewmentioning

confidence: 99%

Functional Cubic Thin Films — A Structure View

Rafaja¹

2004

Adv Eng Mater

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Functionality of advanced materials is determined by their electronic structure, [1] which is, on the other hand, related to the crystal structure of materials. [2] In other words, materials parameters are controlled by the structure of matters and modified by deviations from the ideal crystal structure, which is called real structure. Thus, a substantial part of the materials science is devoted to the study of the relationship between the real structure and the physical properties of materials. In these studies, the structure research plays a very important role.The relationship between the materials structure and the materials properties is crucial for low-dimensional structures, which can be produced with a huge variety of microstructures and frequently at thermodynamically unstable conditions that causes large variations in the real structure. A typical task to the structure research is then to explain the observed differences in behaviour of materials having the same or nearly the same chemical composition.This contribution illustrates the capability of the structure research and particularly the capability of the X-ray diffraction to investigate the real structure and microstructure of thin films. The experimental examples illustrate the experimental procedure and the theoretical approach applied to a detailed structure study of nanocrystalline UN thin films grown by the physical vapour deposition (PVD). From the microstructural point of view, cubic UN can be used as a representative compound for other nitrides crystallising with the NaCl structure type like TiN or (Ti,Al)N. The unique position of UN is given by its chemical nature. No destructive analytical method, e.g., the transmission electron microscopy, is desired for uranium compounds, thus the X-ray diffraction is asked to supply as much information on real structure as possible. Concerning the relationship between physical properties and microstructure in the cubic UN thin films, a development of the ferromagnetic component was observed below 100 K, although bulk UN is paramagnetic above 53 K and antiferromagnetic below 53 K. Moreover, the critical temperature varied with deposition conditions Ð in particular with the substrate temperature during the deposition process. As a reason for the observed difference in the magnetic behaviour, variations in the microscopic and mesoscopic structure were anticipated. A distinct influence on the magnetic characteristics was expected due to the crystallite size, because the uncompensated magnetic moments at the crystallite boundaries can produce a ferromagnetic component. On the contrary, our results have shown that the crystallite size does not change significantly in individual samples. Still, large differences among the samples were found in the crystal deformation, which modifies the interatomic distances and consequently the band structure and the magnetic properties of the UN thin films. It is known from earlier experiments [3] that hydrostatic pressure decreases the NØel temperature of the cubic UN, cle...

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Residual Stress in Ion Implanted Titanium Nitride Studied by Parallel Beam Glancing Incidence X-Ray Diffraction

Cited by 25 publications

References 22 publications

Transmission Electron Microscopy and X-ray Diffraction Investigation of the Microstructure of Nanoscale Multilayer TiAlN/VN Grown by Unbalanced Magnetron Deposition

Transmission Electron Microscopy and X-ray Diffraction Investigation of the Microstructure of Nanoscale Multilayer TiAlN/VN Grown by Unbalanced Magnetron Deposition

Mechanism of improvement of TiN-coated tool life by nitrogen implantation

Functional Cubic Thin Films — A Structure View

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