Resist evaluation for proton beam writing, Ni mold fabrication and nano-replication

Nano-injection molding with resin mold inserts for prototyping of nanofluidic devices for single molecular detection

“…Their fabrication usually requires use of different fabrication methods in series to generate the microfluidic networks and nanostructures. For example, conventional photolithography and wet/dry etching can be used to produce microfluidic networks and that needs to be combined with one or more nanofabrication methods including extreme ultraviolet lithography, electron beam lithography, 29,30 proton beam writing, 31 or focused ion beam milling (FIB) 32,33 to make the pre-requisite nanostructures. Among those methods, FIB milling has been used as a versatile tool for nanofluidic structures with advantages of not requiring resists, photomasks, or a subsequent etching process; the ion beam is used directly to mill structures into the desired substrate.…”