Resolution and sensitivity of wafer-level multi-aperture cameras

Abstract

Abstract. The scaling limits of multi-aperture systems have been widely discussed from an information-theoretical standpoint. While these arguments are valid as an upper limit, the real-world performance of systems for mobile devices remains restricted by optical aberrations. We argue that aberrations can be more easily controlled with certain architectures of multi-aperture systems, especially those manufactured on wafer scale (wafer-level optics, WLO). We complement our analysis with measurements of one single-and one multiaperture WLO camera. We examine both sharpness and sensitivity, giving measurements of modulation transfer function and temporal noise, and showing that multi-aperture systems can indeed reduce size without compromising performance. © The Authors. Published by SPIE under a Creative Commons Attribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requires full attribution of the original publication, including its DOI.

Optic flaws detection and location based on a plenoptic camera

“…For a plenoptic camera, as shown in Fig. 1, the microlens is focused on the image shrunk by the main lens, hence, the depth of field in the image space of the main lens is determined by the depth of field in the object space of the microlens [15] . Therefore, we can use the depth of field in the object space of the microlens to represent the depth of field in the image space of the main lens; since p ≪ d, then, the depth of field in the object space of microlens δ P can be approximated by where…”