Abstract:Alkaline treatment of the photoresist under ultrasonic irradiation has been investigated to improve the resolution capability of resist patterns with higher throughput. The selectively dissolved phenol resin for the combination of the alkaline treatment with ultrasonic irradiation was increased by 2.3 times compared to the solely alkaline treatment. The sensitizing effect of naphthoquinone diazide (sensitizer) based on phenol was increased to 0.46 against dip treatment of 0.31. As a result, resist sensitivity … Show more
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