Resolution enhancement using pulse width modulation in digital micromirror device-based point-array scanning pattern exposure

Kuo, Hung-Fei; Huang, Yijun

doi:10.1016/j.optlaseng.2015.12.002

Cited by 11 publications

(3 citation statements)

References 20 publications

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“…Nanoimprint can also achieve nanoscale resolution; however, it can only produce two-dimensional (2D) structures on flat surfaces, and processing threedimensional (3D) structures is challenging. DLP has attracted considerable attention because of its rapid printing speed and micron-level molding accuracy [34][35][36][37] . However, the step effect between the layers leads to a rough surface in the processed structure, which seriously affects the imaging performance of the optical elements 38,39 .…”

Section: Introductionmentioning

confidence: 99%

Imaging/nonimaging microoptical elements and stereoscopic systems based on femtosecond laser direct writing

Huang,

Hong,

Chen

et al. 2023

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The development of modern information technology has led to significant demand for microoptical elements with complex surface profiles and nanoscale surface roughness. Therefore, various micro-and nanoprocessing techniques are used to fabricate microoptical elements and systems. Femtosecond laser direct writing (FsLDW) uses ultrafast pulses and the ultraintense instantaneous energy of a femtosecond laser for micro-nano fabrication. FsLDW exhibits various excellent properties, including nonlinear multiphoton absorption, high-precision processing beyond the diffraction limit, and the universality of processable materials, demonstrating its unique advantages and potential applications in three-dimensional (3D) micro-nano manufacturing. FsLDW has demonstrated its value in the fabrication of various microoptical systems. This study details three typical principles of FsLDW, several design considerations to improve processing performance, processable materials, imaging/nonimaging microoptical elements, and their stereoscopic systems. Finally, a summary and perspective on the future research directions for FsLDW-enabled microoptical elements and stereoscopic systems are provided.

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Section: Introductionmentioning

confidence: 99%

Imaging/nonimaging microoptical elements and stereoscopic systems based on femtosecond laser direct writing

Huang,

Hong,

Chen

et al. 2023

gxjzz

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show abstract

“…[14][15][16][17] At present, DMD-based digital lithography mainly includes the dynamic projection lithography method [18][19][20][21][22] and dynamic scanning lithography method. [23][24][25][26] In the former case, due to the limited size of DMD surface size, the processing of large-area high-resolution microstructures cannot be realized by a single projection. The latter dynamic scanning lithography can realize the high-efficiency processing of large-area microstructures by combining the dynamic updating of DMD pixels with the control of the motion stage.…”

mentioning

confidence: 99%

Stitching error compensation for large-area microstructures based on digital oblique scanning exposure mode

Huang¹,

Wang²,

Zheng³

et al. 2020

Appl. Phys. Express

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We proposed an efficient method for improving the stitching precision of large-area microstructures. A clever triangular region compensation strategy based on a digital micromirror device oblique scanning exposure mode was developed, which can effectively enhance lithographic resolution and complete seamless stitching. In order to ensure the optimal stitching effect, the stage self-calibration technology was also introduced into the exposure system. The experimental results showed that the stitching region traces can be effectively eliminated and smoothed by the above strategy. The presented method will have important applications in the printed circuit board and flat panel display fields.

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“…It sometimes takes several hours to complete a mask, which is generally not suitable for large-scale production. This study is focused on the digital micromirror device (DMD)-based maskless digital lithography, which adopts the method of projection scanning lithography [13][14][15][16][17] for exposure, so that it can effectively improve the processing efficiency.…”

mentioning

confidence: 99%

Precise fabrication of large-area microstructures by digital oblique scanning lithography strategy and stage self-calibration technique

Huang

Wang

et al. 2019

Appl. Phys. Express

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We proposed an efficient and low-cost method for precise fabrication of large-area microstructures. A programmable digital lithography system based on digital micromirror device (DMD) oblique scanning strategy was developed, which can effectively reduce pixel quantization errors and complete a sub-pixel exposure accuracy. To further reduce the cost and enhance the flexibility of the fabrication system, a two-dimensional (2D) stage self-calibration technique is studied, which can replace the laser interferometer measurement (LIM) system and ensure the calibration accuracy well. The presented method is promising for developing large-area microstructure applications such as flat panel display (FPD), organic light-emitting diodes (OLED).

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Resolution enhancement using pulse width modulation in digital micromirror device-based point-array scanning pattern exposure

Cited by 11 publications

References 20 publications

Imaging/nonimaging microoptical elements and stereoscopic systems based on femtosecond laser direct writing

Imaging/nonimaging microoptical elements and stereoscopic systems based on femtosecond laser direct writing

Stitching error compensation for large-area microstructures based on digital oblique scanning exposure mode

Precise fabrication of large-area microstructures by digital oblique scanning lithography strategy and stage self-calibration technique

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