2003
DOI: 10.1063/1.1567057
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Resonant ionization of laser desorbed silicon

Abstract: Soft ultraviolet laser desorption of neutral and ionized Si atoms was investigated at 355 nm for fluences ranging from the desorption threshold ͑85 mJ/cm 2 ) up to 165 mJ/cm 2 . The sensitivity of resonance ionization mass spectrometry enabled the number of sputtered particles to be studied at a very low emission level corresponding to only several 100 atoms. For such a low emission yield, the ejected atoms keeps the memory of the laser-surface interaction mechanism during their flight in the ultrahigh vacuum … Show more

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Cited by 4 publications
(8 citation statements)
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“…The method was applied to the analysis of 19 single presolar silicon carbide grains (diameter 2.3-5.3 mm) recovered from the Murchison meteorite and pressed in a thin sheet of gold. 148 The 2s uncertainties of v15% (relative) for d 135 Ba, d 137 Ba and d 138 Ba (normalized on 136 Ba) compared well with results obtained previously using SIMS or TIMS.…”
Section: Analytical Methodologysupporting
confidence: 83%
See 2 more Smart Citations
“…The method was applied to the analysis of 19 single presolar silicon carbide grains (diameter 2.3-5.3 mm) recovered from the Murchison meteorite and pressed in a thin sheet of gold. 148 The 2s uncertainties of v15% (relative) for d 135 Ba, d 137 Ba and d 138 Ba (normalized on 136 Ba) compared well with results obtained previously using SIMS or TIMS.…”
Section: Analytical Methodologysupporting
confidence: 83%
“…262 Oxygen gas was leaked into the ion source chamber to maintain a stable beam (1610 211 A) of 142 CeO 1 ions. Data were normalized to 136 Ce: 142 Ce 0.016 88 using the exponential law and corrections were made for isobaric interferences from CeO, 138 LaO, 142 NdO and 141 PrO. A 138 Ce: 142 Ce ratio of 0.022 580 0¡0.000 001 9 (2s) was measured for Johnson-Matthey JMC304 (high purity CeO reagent).…”
Section: Analytical Methodologymentioning
confidence: 99%
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“…The multi-pulse damage threshold determined in [14] is well consistent with that evaluated here. Similar incubation effect in silicon was observed recently with ns laser pulses [8,15]. The precise nature of the incubation effect is not clear (it can be, e.g., due to chemical modification, mechanical stress, defect accumulation [14,15]) and needs further investigation.…”
Section: Monatomic Simentioning
confidence: 63%
“…One of the most developed was the injection of ultra-short bursts in RF accelerators. Such electron bursts have also been used in the eighties for diagnostics of RF plasma sheaths in 13.56 MHz capacitive low pressure discharges, where the injection time within an RF period revealed the time behaviour of the RF sheaths [21][22][23][24][25][26]. This section concerns the first step of the development of a similar tool for the diagnosis of the near exhaust plasma of a Hall thruster and presents a characterization of the production of photo induced electron bursts.…”
Section: Characterization Of Laser Induced Photoelectron Bursts From ...mentioning
confidence: 99%