Resputtering effect during MgO buffer layer deposition by magnetron sputtering for superconducting coated conductors

Xiao, Shaozhu; Feng, Feng; Shi, Kai; Deng, Shutong; Qu, Timing; Zhu, Yongpei; Lu, Hongyuan; Huang, Rongxia; Han, Z.

doi:10.1116/1.4921198

Cited by 12 publications

(4 citation statements)

References 26 publications

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“…It was also found that the average EMSE showed some variations after Ag/FC sputtering. The variations were due to the occurrence of possible resputtering phenomena during the FC sputtering [21]. The resputtering phenomenon of Ag particles was resulted from the bombardment of energetic particles mainly comprising fluorine (F) atoms and negative fluorine (F − ) in this experiment.…”

Section: Resultsmentioning

confidence: 96%

Characterisation of PET nonwoven deposited with Ag/FC nanocomposite films

Yuan

Wei

et al. 2017

Surface Engineering

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Silver/fluorocarbon (Ag/FC) nanocomposite films were successfully deposited on the polyester (PET) nonwoven using magnetron sputtering techniques with pure silver (Ag) and polytetrafluoroethylene (PTFE) targets. FT-IR, XPS, XRD and EDX were used to examine the compositions and structure of Ag and Ag/FC films. SEM and AFM were employed to observe the surface morphology. Hydrophobicity properties and electromagnetic shielding properties of the Ag-and Ag/FC-coated PET nonwoven were also investigated. The experimental results showed that the films deposited on PET nonwoven were even and dense. The Ag existed in the films was elemental silver which had high degree of crystallinity. In contrast, the FC film did not form crystalline structure containing five components, i.e. -CF 3 , -CF 2 -, -CF-, -C-CFand -C-C-, C-F groups clearly observed by the FT-IR spectrum. Compared with the original PET nonwoven, hydrophobicity properties and electromagnetic shielding properties of the PET nonwoven deposited with Ag/FC nanocomposite films were improved significantly.

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Section: Resultsmentioning

confidence: 96%

Characterisation of PET nonwoven deposited with Ag/FC nanocomposite films

Yuan

Wei

et al. 2017

Surface Engineering

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“…Ion bombardment can lead to textural changes and the latter is also valid for NOI bombardment. For example, NOIs seem to control the the film texture of MgO thin films deposited by RF magnetron sputtering [195,196]. Textural changes as function of the reactive gas flow are also often observed during reactive sputtering when the target state changes from metallic to poisoned.…”

Section: Film Texturementioning

confidence: 99%

The measurement and impact of negative oxygen ions during reactive sputter deposition

Depla

2023

Critical Reviews in Solid State and Materials Sciences

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Many thin film applications are based on oxides. The optimization of the oxide properties is an on-going process and requires a deep understanding of the deposition process. A typical feature of reactive (magnetron) sputter deposition is the presence of negative oxygen ions. Two groups of ions can be identified based on their energy. Low energy ions are generated in the bulk of the discharge. The high energy ions are emitted from the oxide or oxidized target surface. As these ions are generated at the cathode, they are accelerated by the electric field towards the growing film. Depending on the discharge voltage and the powering method, their energy is typically several tenths to hundreds electron volt. As such the ions can have a strong impact on the film properties. In the case of magnetron sputtering, this will lead to inhomogenous film properties over the substrate facing the locally eroded target. Due to their high energy, the trajectory of negative ions can be easily predicted which has led to several strategies to avoid negative ion bombardment such as facing target sputtering and off-axis sputtering. This paper reviews several facets of the production, the measurements and the impact on the film properties of negative ions during reactive sputtering. Despite the many illustrative studies on the impact of negative oxygen ions, quantification is often lacking as the negative ion yield is only known for a few oxides. The compilation of several literature sources allows the discussed trends to be placed in a quantitative framework.

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“…Barabasi et al [44] summarised the fractal characteristics during surface growth. Silver thin films with silicon substrates are prepared using a radio frequency magnetron sputtering system; this process is similar to the fabrication of CeO 2 /YSZ buffer layer by Zhang et al [45] and the deposition of MgO buffer layer by Xiao et al [46]. During the coating process, the working power is 100 W, the coating time is 12 min, and the substrate temperature is 300 • C. The surface morphologies of the silver thin film measured by AFM (tapping mode) at L of 1 µm are illustrated in Figure 2.…”

Section: Surfaces Of a Silver Thin Filmmentioning

confidence: 99%

Robustness of Surface Roughness against Low Number of Picture Elements and Its Benefit for Scaling Analysis

Zhou

Feng

et al. 2020

Coatings

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Surface roughness is widely used in the research of topography, and the scaling characteristics of roughness have been noticed in many fields. To rapidly obtain the relationship between root-mean-squared roughness (Rq) and measurement scale (L) could be helpful to achieve more understandings of the surface property, particularly the Rq-L curve could be fitted to calculate the fractal dimension (D). In this study, the robustness of Rq against low number of picture elements was investigated. Artificial surfaces and the surfaces of two actual samples (a silver thin film and a milled workpiece) were selected. When the number of picture elements was lowered, Rq was found to be stable within a large portion of the concerned scope. Such a robustness property could validate the feasibility of Rq-L curve obtained by segmenting a single morphological picture with roughness scaling extraction (RSE) method, which was proposed in our previous study. Since the traditional roughness (TR) method to obtain Rq-L curves was based on multiple pictures, which used a fixed number of picture elements at various L, RSE method could be significantly more rapid than TR method. Moreover, a direct comparison was carried out between RSE method and TR method in calculating the Rq-L curve and D, and the credibility and accuracy of RSE method with flatten order 1 and 2 was verified.

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Resputtering effect during MgO buffer layer deposition by magnetron sputtering for superconducting coated conductors

Cited by 12 publications

References 26 publications

Characterisation of PET nonwoven deposited with Ag/FC nanocomposite films

Characterisation of PET nonwoven deposited with Ag/FC nanocomposite films

The measurement and impact of negative oxygen ions during reactive sputter deposition

Robustness of Surface Roughness against Low Number of Picture Elements and Its Benefit for Scaling Analysis

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