G reat amounts of numerical and experimental investigations have been devoted to boosting the signal of plasmonic sensors fabricated from noble metal nanoantennas with sharp edges or with gaps separated by a few nanometers. 1À8 The field enhancement depends mainly on the ability to couple incident photons to localized surface plasmon modes. Such resonant modes are prone to damping by scattering and absorption in the metal and its surrounding materials, thus, limiting the achievable enhancement. 9 By interference with subradiant modes, as in Fano resonant systems, radiative losses can be reduced, but not suppressed completely. 10,11 In any case, the field enhancement is often severely reduced by the presence of adhesion layers. These layers are required to pin the noble metals to the substrate, particularly when the fabrication requires lift-off and sonication or when the applications demand high structural robustness. 12 Thanks to their broad availability and process compatibility with the evaporation of the noble metals, Cr and Ti are the most commonly used adhesion materials, with typical thicknesses ranging between 1 and 10 nm. 13À15 Although the existence of the adhesion layer is an important part of the plasmonic structure, its influence on the near and far field of the plasmonic modes is often neglected. 9,16 The perturbation of the plasmon resonance can be derived from the real and imaginary parts of the adhesion materials dielectric function which affects the refractive index locally and introduces absorption. Under such circumstances, surface and localized surface plasmon resonances (SPR and LSPR) are red-shifted and broadened, leading to reduced signal sensitivities, caused by the reduced quality factor Q of the resonant mode. 17À21 As a consequence, processes where high near-field amplitudes are needed, such as surface enhanced Raman scattering (SERS) and fluorescence, 16 ABSTRACT Adhesion layers, required to stabilize metallic nanostructures, dramatically deteriorate the performances of plasmonic sensors, by severely damping the plasmon modes. In this article, we show that these detrimental effects critically depend on the overlap of the electromagnetic near-field of the resonant plasmon mode with the adhesion layer and can be minimized by careful engineering of the latter. We study the dependence of the geometrical parameters such as layer thickness and shape on the near-field of localized plasmon resonances for traditional adhesion layers such as Cr, Ti, and TiO 2 . Our experiments and simulations reveal a strong dependence of the damping on the layer thickness, in agreement with the exponential decay of the plasmon near-field. We developed a method to minimize the damping by selective deposition of thin adhesion layers (<1 nm) in a manner that prevents the layer to overlap with the hotspots of the plasmonic structure. Such a designed structure enables the use of standard Cr and Ti adhesion materials to fabricate robust plasmonic sensors without deteriorating their sensitivity.