1998
DOI: 10.1109/20.706339
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Reversal mechanism of submicron patterned CoNi/Pt multilayers

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Cited by 52 publications
(34 citation statements)
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“…The associated increase in electron temperature was found to be about 60 K. The demagnetization measurements are complicated by a loss of perpendicular remanence as the temperature approaches T C . Patterning of the multilayers into submicron size elements might be used to maintain the remanence 16 so that the demagnetization effect may be observed more clearly.…”
mentioning
confidence: 99%
“…The associated increase in electron temperature was found to be about 60 K. The demagnetization measurements are complicated by a loss of perpendicular remanence as the temperature approaches T C . Patterning of the multilayers into submicron size elements might be used to maintain the remanence 16 so that the demagnetization effect may be observed more clearly.…”
mentioning
confidence: 99%
“…Interference lithography is one of the optical lithography methods with highest resolution proposed for disk patterning, with which a variety of magnetic island materials have been fabricated and studied, such as thin Co dots, [51][52] tall Co and Ni pillars, [53][54] Co/Pt multilayers and CoNi/Pt multilayers. 55 Interference lithography has also been used as a method to generate nanoimprinting masters, for direct laser annealing of pre-deposited…”
Section: Lithography Methodsmentioning
confidence: 99%
“…This model intrinsically incorporates the correlation between position and size fluctuations. We tested this model on patterned media prepared by laser interference lithography (LIL) [Haast et al, 1998]. BPM fabricated by LIL form excellent test media because the interference patterns have perfect positioning [Luttge et al, 2007].…”
Section: Introductionmentioning
confidence: 99%