2020
DOI: 10.1088/2053-1583/ab5df4
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Reversible crystalline-to-amorphous phase transformation in monolayer MoS2 under grazing ion irradiation

Abstract: By combining scanning tunneling microscopy, low-energy electron diffraction, photoluminescence and Raman spectroscopy experiments with molecular dynamics simulations, a comprehensive picture of the structural and electronic response of a monolayer of MoS2 to 500 eV Xe+ irradiation is obtained. The MoS2 layer is epitaxially grown on graphene/Ir(1 1 1) and analyzed before and after irradiation in situ under ultra-high vacuum conditions. Through optimized irradiation conditions using low-energy ions with grazing … Show more

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Cited by 23 publications
(30 citation statements)
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“…The above findings demonstrate that our sputtering method is selective toward S-vacancy creation within the MoS 2 ML structure without the concurrent removal of Mo atoms, in contrast with previous sputtering-based defect engineering methods. , In particular, as the S atoms are removed by controlled ion bombardment, the MoS 2 phase and corresponding XPS signal are gradually converted into MoS 2– x substoichiometric ones, thus leaving the total Mo 3d XPS area almost unaffected. Selective S atom removal by ion sputtering was also reported in a recent scanning probe measurement on MoS 2 ML, as conducted in a similar grazing angle condition by using lower energy (500 eV) but higher atomic mass xenon atoms . While entirely deduced from XPS peak fitting results, the S-vacancy selectivity of the present defect engineering method is also supported by the difference analysis of Mo 3d XPS raw data (Figure S1 in Supporting Information), showing gradual “spectral weight transfer” toward the low binding energy peaks’ region as the sputtering time increases.…”
Section: Resultssupporting
confidence: 78%
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“…The above findings demonstrate that our sputtering method is selective toward S-vacancy creation within the MoS 2 ML structure without the concurrent removal of Mo atoms, in contrast with previous sputtering-based defect engineering methods. , In particular, as the S atoms are removed by controlled ion bombardment, the MoS 2 phase and corresponding XPS signal are gradually converted into MoS 2– x substoichiometric ones, thus leaving the total Mo 3d XPS area almost unaffected. Selective S atom removal by ion sputtering was also reported in a recent scanning probe measurement on MoS 2 ML, as conducted in a similar grazing angle condition by using lower energy (500 eV) but higher atomic mass xenon atoms . While entirely deduced from XPS peak fitting results, the S-vacancy selectivity of the present defect engineering method is also supported by the difference analysis of Mo 3d XPS raw data (Figure S1 in Supporting Information), showing gradual “spectral weight transfer” toward the low binding energy peaks’ region as the sputtering time increases.…”
Section: Resultssupporting
confidence: 78%
“…Finally, we note that the sample amorphization upon sputtering is supported by a recent scanning probe investigation on a MoS 2 ML where S-vacancies were created by sputtering in similar grazing incident configuration by using lower energy (0.5 keV) but higher mass xenon ions. According to the above results and considerations, we then exclude the interpretation of the tailing as the valence band of MoS 2– x material.…”
Section: Resultssupporting
confidence: 65%
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“…Plasma sputtering may induce the amorphization of MoS 2, resulting in the disappearance of the two E 2g and A 1g Raman modes [41,42]. The Raman spectra of an MoS 2 flake which underwent the ZnO deposition steps of sample G did not show appreciable differences, as reported in Figure 4b, demonstrating that the structure of the 2D MoS 2 is preserved.…”
Section: Raman and Photoluminescence Pl Characterizationmentioning
confidence: 76%
“…In order to address this question, different approaches have been recently developed for the growth of large-area 2D layers 26,41,42 that readily enable conformal nanopatterning. [43][44][45] So far, large-area flat-optics configurations based on 2D semiconductor layers have not been reported, although this represents a crucial step for the implementation of real-world photon harvesting applications in 2D TMDs for broadband photo-conversion and/or -detection.…”
Section: Introductionmentioning
confidence: 99%