Making
electrical contacts to semiconducting transition metal dichalcogenides
(TMDCs) represents a major bottleneck for high device performance,
often manifesting as strong Fermi level pinning and high contact resistance.
Despite intense ongoing research, the mechanism by which lattice defects
in TMDCs impact the transport properties across the contact–TMDC
interface remains unsettled. Here we study the impact of S-vacancies
on the electronic properties at a MoS2 monolayer interfaced
with graphite by photoemission spectroscopy, where the defect density
is selectively controlled by Ar sputtering. A clear reduction of the
MoS2 core level and valence band binding energies is observed
as the defect density increases. The experimental results are explained
in terms of (i) gap states’ energy distribution and (ii) S-vacancies’
electrostatic disorder effect. Our model indicates that the Fermi
level pinning at deep S-vacancy gap states is the origin of the commonly
reported large electron injection barrier (∼0.5 eV) at the
MoS2 ML interface with low work function metals. At the
contact with high work function electrodes, S-vacancies do not significantly
affect the hole injection barrier, which is intrinsically favored
by Fermi level pinning at shallow occupied gap states. Our results
clarify the importance of S-vacancies and electrostatic disorder in
TMDC-based electronic devices, which could lead to strategies for
optimizing device performance and production.