2015
DOI: 10.1002/ange.201506951
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Reversible Dimerization of Phosphine‐Stabilized Silylenes by Silylene Insertion into SiII–H and SiII–Cl σ‐Bonds at Room Temperature

Abstract: Contrary to the classical silylene dimerization leading to ad isilene structure,p hosphine stabilized hydroand chloro-silylenes (2a,b)u ndergo an unique dimerization via silylene insertion into SiÀX s-bonds (X = H, Cl), whichi s reversible at room temperature.DFT calculations indicate that the insertion reaction proceeds in one step in ac oncerted manner.The dimerization of silylenes to the corresponding disilene is one of the most common reactions of these low-coordinate silicon species (type A). Since the sy… Show more

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Cited by 11 publications
(2 citation statements)
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“…Baceiredo and Kato reported the reversible dimerization of phosphine-stabilized silylenes as a consequence of oxidative addition and reductive elimination of Si−H bonds. 408 The reduction of dichlorosilane 545 at room temperature yielded a mixture of hydrosilylene 546 and the dimer 547 as a result of Si− H bond activation (Scheme 172). Initially, the ratio of 546 and 547 was 70:30.…”
Section: Reversible Activation By Group 14 Compoundsmentioning
confidence: 99%
“…Baceiredo and Kato reported the reversible dimerization of phosphine-stabilized silylenes as a consequence of oxidative addition and reductive elimination of Si−H bonds. 408 The reduction of dichlorosilane 545 at room temperature yielded a mixture of hydrosilylene 546 and the dimer 547 as a result of Si− H bond activation (Scheme 172). Initially, the ratio of 546 and 547 was 70:30.…”
Section: Reversible Activation By Group 14 Compoundsmentioning
confidence: 99%
“…The Si−Si distance in 3, 2.394(1) Å, lies in the known range for such interactions, and is comparable to Si−Si distances in related silyl-silylenes, e.g. 2.386(1) Å in 1b, and 2.377(5) Å in {PhC(NBu t ) 2 }Si-Si(H){(Bu t N) 2 C(H)Ph} (Protchenko et al, 2013;Rodriguez et al, 2015;Yamaguchi and Sekiguchi, 2011;Zhang et al 2010).…”
Section: Introductionmentioning
confidence: 57%