2021
DOI: 10.1109/jlt.2021.3066203
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Review of Silicon Photonics Technology and Platform Development

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Cited by 565 publications
(251 citation statements)
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“…One advantage of this method is that all the necessary components are readily available in a standard silicon photonics process. 31 Another advantage is that only one switch at each matrix stage needs to be operated at a time, and the number of matrix stages necessary is log 2ðNÞ. Therefore, for an array with N elements, only log 2ðNÞ switches are operated at once.…”
Section: Switched Mzi Matrixmentioning
confidence: 99%
See 1 more Smart Citation
“…One advantage of this method is that all the necessary components are readily available in a standard silicon photonics process. 31 Another advantage is that only one switch at each matrix stage needs to be operated at a time, and the number of matrix stages necessary is log 2ðNÞ. Therefore, for an array with N elements, only log 2ðNÞ switches are operated at once.…”
Section: Switched Mzi Matrixmentioning
confidence: 99%
“…Ring resonators are a wavelength sensitive device, commonly available in most silicon foundry processes. 31 In a ring resonator, the light will transfer from the input bus to the output waveguide only when the light has a wavelength that is resonant with the ring. 33 Off resonance, the light will stay on the bus waveguide.…”
Section: Ring Resonator Switchesmentioning
confidence: 99%
“…Since this review of silicon photonics is quite a personal history and a story of my contributions to the field, almost all the cited works refer to my own papers. The interested reader can find relevant literature in the original papers or in other recent reviews [12][13][14][15][16][17][18][19][20][21][22][23][24]. At the end of each subsection, I cite few references where recent contributions to the related field are reported.…”
Section: Introductionmentioning
confidence: 99%
“…The use of comparatively small grating periods represents the main technological challenge in the realization of high-performing devices based on SWG metamaterials. Structures sometimes include small features near the resolution limit of dry deep-ultraviolet (DUV) lithography tools [22]. Several demonstrations of SWG-based devices with features larger than about 120 nm and compatible with dry DUV lithography have been proposed in the literature but this normally constraints the available design space and the range of achievable material properties, making the design more complex and ultimately impacting performance [23].…”
Section: Introductionmentioning
confidence: 99%