Review—Recent Advances in Block-Copolymer Nanostructured Subwavelength Antireflective Surfaces

Mir, Sajjad Husain; Rydzek, Gaulthier; Nagahara, Larry A.; Khosla, Ajit; Mokarian‐Tabari, Parvaneh

doi:10.1149/2.0022003jes

Cited by 18 publications

(14 citation statements)

References 66 publications

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“…Once the polymer matrix is removed from the Pt-infiltrated BCP thin films by etching, various conductive Pt structures can be obtained [ 233 ] ( Figure 12 g). Of course, all patterns transferred with the above methods can further be employed in various applications in nanoengineering [ 246 , 249 , 251 , 252 ], quantum technology [ 247 ], or optoelectronics [ 237 ] in order, for example, to manufacture high-performance tribological generators [ 252 ], transistor circuitry [ 206 ], masks for lithographic purpose [ 206 , 253 ], photonic nanostructures [ 240 , 248 ], etc.…”

Section: Bottom–up Lithographic Methodologiesmentioning

confidence: 99%

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Handrea-Dragan

Botiz

2021

Polymers

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There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

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Section: Bottom–up Lithographic Methodologiesmentioning

confidence: 99%

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Handrea-Dragan

Botiz

2021

Polymers

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“…How to achieve a high power absorptance and uniformly high bandwidth simultaneously still remains a challenge. [24] On the other hand, considerable progresses have been achieved towards high-performance THz absorbers based on surface-relief structures in recent years, [25,26] by reducing the surface reflection and improving the transmission or absorption of THz waves as a result of a gradient refractive index.…”

Section: Introductionmentioning

confidence: 99%

A Flexible and Ultra‐Wideband Terahertz Wave Absorber Based on Pyramid‐Shaped Carbon Nanotube Array via Femtosecond‐Laser Microprocessing and Two‐Step Transfer Technique

Xiao

Chen

Sun

et al. 2022

Adv Materials Inter

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With the advances in THz technologies, THz functional devices and integrated systems put forward higher requirements for the development of filters, attenuators and absorbers, whose performance is dependent on the absorption characteristics of the device to the incident THz waves. [12] Therefore, absorbers have gained much interests among THz devices, and become one of the most important components for the applications mentioned above. Wide bandwidth coverage and high power absorptance are critical considerations to evaluate the performances of THz absorbers. These capabilities, however, are not readily available via the use of natural bulk materials. To be more specific, the refractive index of traditional bulk materials is typically greater than unity. [13] For materials that are widely used in THz systems, the refractive index of highresistivity silicon is approximately 3.4, [14] and the values for organic materials such as Polydimethylsiloxane (PDMS), [15,16] Polyethylene terephthalate (PET) and Polymide are between 1.5 and1.8. [17] Therefore, these materials are not ideal for THz absorbers as the former faces considerable surface reflections, [18] while the latter generally have low

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“…Block‐copolymer soft nanolithography is a versatile, robust, and cost‐effective technique to make nanostructured surfaces and produce various types of surface morphologies. [ 13–18 ] The structural dimensions such as pore size, pore depth, and surface area are adjustable by simply employing different block‐copolymers with varying interaction parameters (χ), volume fraction of blocks ( f ), and fine‐tuning microphase separation parameters. [ 15,18–20 ] In this study, we have used poly(styrene)‐ block ‐poly(methyl methacrylate) (PS‐ b ‐PMMA) block‐copolymer to define an etch mask for producing a nanoporous Si substrate, with AuNPs encapsulated in the nanopores for photocatalytic applications.…”

Section: Introductionmentioning

confidence: 99%

Enhanced Dye Degradation through Multi‐Particle Confinement in a Porous Silicon Substrate: A Highly Efficient, Low Band Gap Photocatalyst

Mir

Jennings

Akinoglu

et al. 2021

Advanced Optical Materials

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A platform is introduced for fabrication of a reusable and highly efficient low band gap photocatalyst by confining gold nanoparticles (AuNPs) in the pores of a nanopatterned Si monolith (AuNSM). Due to their size, a maximum of two AuNPs can assemble in a single pore, thus preventing agglomerations. Their access to the analyte provides more active sites for redox reaction, leading to enhanced efficiency. While proximity of nanoparticles enhances coupling efficiency, confinement prevents rapid recombination of photogenerated charge carriers, a major factor contributing to low efficiency of photocatalytic materials. Degradation of methyl orange (MO) is used to determine the photocatalytic efficacy of AuNSM compared to 1) bare silicon and 2) AuNPs randomly dispersed on silicon. After 90 min of exposure to UV light (λ = 353 nm) in the AuNSM, the MO absorption is <1%, indicating near complete degradation, while it is still 85% and 70% for systems (1) and (2), respectively. Finite element method simulations of the confined structure suggest that the AuNPs act as a mediator/receptacle for photogenerated charges rather than a source of them at this wavelength and thus enhance the performance of the photocatalyst by creating more effective Schottky junctions—preventing recombination of electrons and holes—rather than by a localized surface plasmonic resonance effect.

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Review—Recent Advances in Block-Copolymer Nanostructured Subwavelength Antireflective Surfaces

Cited by 18 publications

References 66 publications

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

A Flexible and Ultra‐Wideband Terahertz Wave Absorber Based on Pyramid‐Shaped Carbon Nanotube Array via Femtosecond‐Laser Microprocessing and Two‐Step Transfer Technique

Enhanced Dye Degradation through Multi‐Particle Confinement in a Porous Silicon Substrate: A Highly Efficient, Low Band Gap Photocatalyst

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