1992
DOI: 10.1016/0038-1101(92)90318-7
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Revised theory of current transport through the Schottky structure

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Cited by 17 publications
(13 citation statements)
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“…Numerical solutions of a Schottky contact typically utilize the concept of “effective recombination velocity”, first introduced by Crowell and Sze in the wake of semiconductor device modeling development. , By using separate recombination velocities for electrons and holes, the electron ( J n ) and hole ( J p ) currents at the contact can be expressed as ,, where v s,n and v s,p are the electron and hole surface recombination velocities (see Figure a). Moreover, n s0 and p s0 are the equilibrium concentrations of electrons and holes at the interface, and n s and p s are the nonequilibrium concentrations of electrons and holes at the interface, respectively.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Numerical solutions of a Schottky contact typically utilize the concept of “effective recombination velocity”, first introduced by Crowell and Sze in the wake of semiconductor device modeling development. , By using separate recombination velocities for electrons and holes, the electron ( J n ) and hole ( J p ) currents at the contact can be expressed as ,, where v s,n and v s,p are the electron and hole surface recombination velocities (see Figure a). Moreover, n s0 and p s0 are the equilibrium concentrations of electrons and holes at the interface, and n s and p s are the nonequilibrium concentrations of electrons and holes at the interface, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…17 Numerical solutions of a Schottky contact typically utilize the concept of "effective recombination velocity", first introduced by Crowell and Sze in the wake of semiconductor device modeling development. 43,44 By using separate recombination velocities for electrons and holes, the electron (J n ) and hole (J p ) currents at the contact can be expressed as 38,45,46…”
Section: Introductionmentioning
confidence: 99%
“…These morphological and structural inhomogeneities incorporate a low and high barrier along with the MS interface. At low temperature the current through the lower barriers lies in the applied potential distribution [60,69,70]. Authors in [64] showed that the Richardson constant calculated from the J-V-T characteristics depends strictly on the barrier inhomogeneities.…”
Section: A Forward-bias J-v-t Characteristics Of a /P-cis/sno 2 :Fmentioning
confidence: 99%
“…Our approach is based on the revised theory of current transport through the Schottky structure [6]. In this theory the influence of the generation-recombination mechanism is added to the drift-diffusion current through the semiconductor and when this is neglected by setting U ( x ) = 0 we will get the relations derived previously by Crowell and Sze [7].…”
Section: Our Approachmentioning
confidence: 99%
“…Modifying the equation for total current density from [6] by introducing the boundary conditions (7) and (13) to (16) gives the total current flowing through a metal-semi-conductor-metal structure [8] fr n0 -exp (5)…”
Section: Our Approachmentioning
confidence: 99%