2006
DOI: 10.1109/tps.2006.873253
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Revisiting the anomalous RF field penetration into a warm plasma

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Cited by 79 publications
(82 citation statements)
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“…the electrons adjacent to the sheath edge are accelerated by a single interaction with the expanding sheath into the plasma bulk. This is similar to Fermi heating [15] and has been described by the Hard Wall Model [16] or other more elaborated models [17][18][19][20][21][22][23][24][25][26][27][28][29]. Here, we demonstrate that this understanding is not complete, via a modeling study of symmetric argon and helium plasmas driven at 13.56 MHz.…”
Section: Introductionsupporting
confidence: 75%
“…the electrons adjacent to the sheath edge are accelerated by a single interaction with the expanding sheath into the plasma bulk. This is similar to Fermi heating [15] and has been described by the Hard Wall Model [16] or other more elaborated models [17][18][19][20][21][22][23][24][25][26][27][28][29]. Here, we demonstrate that this understanding is not complete, via a modeling study of symmetric argon and helium plasmas driven at 13.56 MHz.…”
Section: Introductionsupporting
confidence: 75%
“…So it is doubtful if any gaseous plasma is accurately described by this theory, although there might be solid state plasmas compatible with these assumptions. However, this line of theoretical investigation has recently been revisited by Kaganovich et al [38,15]. Their approach aims to treat the sheath structure by the assuming the existence of a step function in the plasma density at the ion sheath edge, so that there is a uniform density n b in the bulk plasma and a uniform density n s in the sheath, with a step at the interface between the plasma and the sheath.…”
Section: Single Frequency Dischargesmentioning
confidence: 99%
“…(54) is easy to evaluate and is fairly consistent with simulation and experimental data, insofar as systematic comparisons exist. The most recent variation of on this approach is due to Kaganovich et al [15]. Their model differs from Eq.…”
Section: Hard Wall Modelsmentioning
confidence: 99%
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“…On account of increasing industrial applications [1][2][3][4][5] like semiconductor fabrication, flat panel display and thin film deposition, radio frequency (RF) capacitively coupled plasma (CCP) discharges is a subject of intensive experimental and theoretical research. In general the capacitive discharge is agitated by applying a potential across the electrodes in contact with plasma [6]; naturally it leads to a plasma sheath formation near electrodes with a span of electric field characterised by Debye length (λ d ).…”
Section: Introductionmentioning
confidence: 99%